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CIPDBChina IndustryMetallurgy, Mineral & EnergyTarget Material



China, Chinese Tiox Alloy Ceramic Target Titanium Dioxide Titanium Oxide Sputtering Target1 Industrial Products Supplier Manufacturer Details, price list catalog:

China Products Details Supplier Manufacturer price list catalog
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Target MaterialTitanium Oxide TargetTitanium Oxide

Lonwin Industry Group Limited

Preview:

Product Description TiOx Titanium Oxide Sputtering TargetProduct Name: Titanium Oxide Sputtering TargetPurity:  99.95%; 3N,3N6,4NColor: Metallic ColorSurface: Polished SurfaceShape: Flat target, Rotating targetApplication: Optical coatings, ElectronicsProduct ParametersTitanium Monoxide (TiO) sputtering targets are specialized materials used in the deposition of thin films for advanced technologicalapplications. TiO films exhibit unique electronic, optical, and structural properties, making them essential for use in semiconductors,photovoltaics, sensors, and other innovative devices. These targets are precision-engineered to ensure high performance and reliabilityin vacuum deposition processes. ItemSpeciifcationPurity¡Ý99.5% for high-quality thin-film productionDensityApprox. 4.95 g/cm3ShapesPlanar, rotary, and custom geometriesSizesAdaptable to meet unique deposition system specificationsSurface FinishPrecision-polished for uniform sputtering performanceFeature1. High Purity: Ensures superior film quality and minimal contamination.2. Stable Properties: Excellent thermal and chemical stability under deposition conditions.3. Customizable Forms: Available in various sizes and shapes to suit specific system requirements.4. Versatile Performance: Suitable for a wide range of thin-film applications.5. Durability: High mechanical strength for extended usability.Product ApplicationApplication1. Semiconductor Devices: Enhances conductivity and performance in microelectronics.2. Photovoltaics: Improves efficiency and durability in solar cells.3. Optical Coatings: Delivers high reflectivity and durability for lenses, mirrors, and filters.4. Sensors: Key material for fabricating gas and pressure sensors with enhanced sensitivity.5. Energy Storage: Utilized in advanced batteries and supercapacitors.Related ProductsLonwin provides one of the industry's most extensive ranges of sputtering target materials, available in all popular geometries, sizes,and materials. Our sputtering targets are essential for applications across various industries, including semiconductors, data storage,displays, and solar energy. Designed for high-performance coatings, they are widely used in microelectronics, optical films, andadvanced material development, meeting the stringent quality and purity standards required in modern technology and innovation.Sputtering TargetsTiCrCuAlFeNiZnSnStainless SteelSiCTaNbZrHfInVWMoCoMgMnGeRuTiAlTiSiTiWTiAlSiCrAlCrSiSiAlZnSnZnAlAlCuNiCrNiVNiFeNiCuFeCoTiNbTiZrInSnCuZrTiOxNb2OxZrO2AZOTZOATOAl2O3ZnOFe2O3MgOPbOGd2O3IGZOGZOSiO2SiOB4CSiCWCTiCTi-CrTi-NiNi-AlNi-Cr-SiNi-Nb-TiNi-TiAl-AgAl-NdAl-SiAl-Si-CuCu-CoCu-GdCu-InCu-NiZr-AlZr-FeAl4C3Cr3C2HfCLaC2Mo2CNbCNi3CTaCVCZrCCoSi2MoSi2NbSi2NiSi2TaSi2TiSi2VSi2WSi2ZrSi2ITOIZOYSZZrO2+SiO2Al2O3+ZrO2Al2O3+MgOCaF2+CeF3CuO+In2O3Welcome to contact us.Welcome to contact us to get complete COA.Shanghai Lonwin Chem is a leading manufacturer and supplier of chemicals in China.We develop,produce and distribute high quality pharmaceuticals, intermediates, special chemicals and other fine chemicals. We could give you: 1.Best quality in your requirement 2.Competitive price in China market 3.Mature Technical support 4.Professional logistic support All we want is win-win business. Send yr. inquiries, you will get it!Storage:keep container tightly closed in a dry and well-ventilated place.Packing:25kgs/bag or 25kgs/drum WeightPacking<25KGBy foil-alum bag/pap/bottle¡Ý25kgPackage: 25kg/drum/bag or as your requestPackaging & DeliveryCompany ProfileLonwin Chemical Industry Group is a leading 3D printing metal powder manufacturer in China. It has beenfocusing on the research and development (R&D) and industrialization of micro-scale and nano-scale metal powdermaterials for several years. As a first-class enterprise providing a diverse range of different metal materials for theadvanced manufacturing industry, Products cover high entropy (medium entropy) alloy powder, high-temperaturealloy powder, self-fusing alloy powder, memory alloy powder, precision soft magnetic alloy powder, spraying powder,nickel alloy powder, cobalt alloy powder, copper alloy powder, high-strength steel powder, tool steel powder, structuralsteel powder, stainless steel powder, amorphous material powder, shielding absorbing material powder, titanium alloyaluminum alloy powder, as well as a series of high-quality metal powders for 3D printing like high-nitrogen steel andduplex steel powders. The company has established long-term cooperative relations with customers in over 40 countries and regionsincluding North America, Europe, and the Middle East, and holds a leading position in the industry. At present, thecompany has passed a number of certifications such as ISO9001, ISO14001, ISO45001. With a global vision,RD-Best New Materials will continue to innovate in technology, strengthen R&D breakthroughs in low-carbon, greenand recyclable materials and production processes, provide customers with high-quality and low-cost metal powders,and actively promote the industrialization of the 3D printing industry.FAQQ1: Are you a factory or trading company?A: Yes ,We are a factory.Q2: What are the key properties of metal powder I should be concerned with when selecting one kind of powder for my application?A: The key properties of metal powder that define their performance level for different applications include purity , particle size , impurity content , and loose density.Q3: Do you test all your goods before delivery?A: Yes, we have 100% test before delivery.Q4: How about the packing?A: Usually we provide the packing as 50 kg Iron Drum or Paper Drum,if you have special requirements on them, we will according to you.Q5: Can you produce according to the sample we provided?A: Yes, we can produce by your samples or technical parameters.Q6: How about the quality?A: We can provide you with revelent certificates if necessary. 100%QC in produce process and before the goods being packed up.

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Target Material: Tiox Alloy Ceramic Target Titanium Dioxide Titanium Oxide Sputtering Target
Pure 5n Cu Copper Cathode Sputtering Target2431byte
99.95% Moly Tube Target Sputtering Molybdenum Target1606byte
Lork Custom ASTM B393 Purity Niobium Materials 5n5 Disc for Semiconductor Sputtering Target Pure Niobium Cake4068byte
99.9% 50nm, 99.8% 800nm Stannum/Tin Nanoparticles2628byte
Molybdenum Disc Target for Vacuum Sputtering Coating1808byte

Laboratory Equipment Coating Consumables Nano Iridium Powder, Nano Tungsten Powder, Nano Nickel Powder16664byte
99.9% Low-Cost High-Purity Cobalt Powder1527byte
High-Quality Rotary Zirconium Sputtering Target Zirconium Tube Target1999byte
99.99% High Purity Gold Tin Alloy Sputtering Target1402byte
Chromium Metal Particle Chromium Granule3511byte

Metal Tizr Alloy Sputter Titanium Zirconium Sputtering Target for Coating5855byte
Silicon Carbide Sic High Purity Coated Ceramic Target Magnetron Sputtering Processing Customization2137byte
Te Target Tellurium Sputtering Target for Solar Photovoltaics3259byte
High Quality Germanium Ge Sputtering Target for Vacuum PVD Coating1654byte
Anode Copper Caps, Rotating Anode Targets for X Ray Tube Insert Parts6736byte

Znse Sputtering Target for PVD Coating1121byte
Black Round Yb High-Purity Sputtering Metal Target for Flat Panel Display2476byte
Ti Sputtering Titanium Target/Titanium Sputter Target/Vacuum Coating Titanium Target2159byte
99.99% Chromium Sputtering Target Chromium Coating Chromium Target1364byte
Lork Custom High Purity Nickel Alloy 4n5 Round Cake for Semiconductor Sputtering Target Disc3650byte

Versatile Nano Aluminum Oxide Powder for Industrial Use and Manufacturing373byte
Laboratory Equipment Coating Consumables Nano Aluminum Oxide Powder16765byte
3D Printing 15-45μ M Chromium Nanoparticles1946byte
Molybdenum Target for Vacuum Sputtering Coating1798byte
Best Price Nano Nickel Powder1527byte

Customized Tungsten Product Sputtering Pure Tungsten Target1503byte
Sputtering Target1697byte
Aluminum Titanium Alloy Cathode Magnetron Sputtering Target Alti Alloy Target919byte
Nickel Target 99.99 High Purity Sputtering Plane Target1403byte
99.95% 1-3mm Chromium Cr Granules for Vacuum Coating3511byte

99.99% Pure Zinc Oxide Sputtering Target ZnO Target for Magnetron Coating1177byte
Custom Size Rare Earth Sputtering Target Lanthanum Target2138byte
Lork Custom Purity Tantalum Materials 5n5 Disc for Semiconductor Sputtering Target Pure Tantalum Cake4387byte
High Quality 98% Purity Vanadium Dioxide CAS 12036-21-41878byte
Boron Powder Standard Laboratory Coating Consumables16239byte

Low Price and High-Quality Nickel Powder 99.99% Metal Powder1702byte
High Purity Magnetron Sputtering Nickel Target1403byte
Oxygen Free Copper Vacuum Coating Target Ofhc Copper Tube Target2762byte
Chromium Granule for Vacuum Coating3511byte
99.9% Pure Tial Titanium Aluminum Alloy Sputtering Target for Decoration Coating6803byte

99.99% Tungsten Titanium Sputtering Target, Wti10 Square Sputtering Target Manufacturer2928byte
Molybdenum Anode Target for X Ray Tube6736byte
Metal Sputtering Target Germanium Ge Inexpensive Price1654byte
V2O5 Target Vanadium Oxide Ceramic Target For LCD3212byte
Xinkang Customized 99.99% High Purity Aluminum Sputtering Target for Vacuum Coating3995byte

OEM Cutstomize Size Special-Shaped Sputtering Target Metal Target1815byte
Lork Custom Csf Alloy Precious Metal Round Cake 99.99% Purity Csf Gold Sputtering Target Disc2611byte
Polished Molybdenum Sputtering Target (99.95% pure)1248byte
High Purity Tin 15/45/75 μ M Stannum Nanopowder at Best Price2626byte
Standard Laboratory Coating Consumables Magnetron Sputtering Coating Targets16750byte

High Purity Crystalline Tungsten Powder Is Suitable for Thermal Spraying Industry3081byte
High Quality Titanium Cathode Magnetron Sputtering Coating Target919byte
High Purity Chromium Target for Vacuum/PVD Coating1403byte
Optical Vacuum Coating Material Silicon Si Granule3494byte
99.99% High Purity Cofe Cobalt Iron Alloy Sputtering Target for Thin Film Coating6829byte

2-4inch 99.95% Rhodium Target Manufacture1687byte
Professional Manufacturer for Rotary Anode Sputtering Target, Molybdenum Rhenium Tungsten Composite Rotating Anode Target6736byte
Mn Target Manganese Sputtering Target for Optical Thin Film Coating/PVD Film Coating3223byte
Manufacture Value Price Titanium Ti Sputtering Target China1654byte
Custom Size Rare Earth Special-Shaped Sputtering Metal Target for Solar Cell1815byte

Arc Cathode Zirconium Target for Precision Magnetron Sputtering Applications1999byte
Silicon Granule for Used as a Semiconductor Material3494byte
99.99% Cr3c2 Targets Chromium Carbide Ceramic Sputtering Targets6012byte
High Quality Molybdenum Copper Bonding X Ray Medical Device Part Rotors7854byte
High Purity 99.999% Tungsten W Target Tungsten Metal Sputtering Target for Coating2883byte

SeAsGeSi Target Selenium As Germanium Silicon Ceramic Sputtering Target for Optical Thin Film Coating3233byte
Durable Optical Coating Rare Earth Yttrium Sputtering Metal Target2232byte
Metal Sputtering Target Tin Stannum Sn Inexpensive Price1652byte
PVD Target 3n Fe2o3 Disc Iron Trioxide Sputtering Target with Copper Backing Plate1638byte
High Purity of Zirconium Tube Sputtering Target Zirconium Pipe Zirconium Magnetron Vacuum Coating Target1999byte

High Purity Silicon Nitride Target Material1402byte
99.95% Purity Chromium Pellets with 1~3mm Irregular Shape3511byte
3n5, 4n Alsi Aluminum Silicon Alloy Sputtering Target for Semiconductor Use6740byte
99.95% Wholesale China Pure Nb Metal Sputtering Target Niobium Sheet1761byte
X Ray Tube Consumables-Stationary (fixed) Anode10092byte

Cr Rod Sputtering Target for Decoration Film Coating3293byte
High Purity 99.995% Indium in Sputtering Target1652byte
High Quality Yttrium Oxide Y2o3 Sputtering Target Coating Material2232byte
Customized Size Znal95/5wt% Zinc Aluminum Alloy Sputter Target for Coating4537byte
High Purity 99.9% 60nm, 99.6% 600nm Chromium Nanoparticles1958byte

Tantalum Target, Tantalum Plate, Magnetron Sputtering Coating Machine Consumables16761byte
99.9% High-Purity High-Quality Copper Powder Suitable for Conductive Ink1871byte
Copper Target PVD Vacuum Sputtering Target1402byte
Titanium Aluminum/Tial / Cr/Zr/Ti Target for PVD Coating Machine/Plant/Equipment/System919byte
High Quality 1-3mm High Purity 99.95% Cr Chromium Granule for Coating3511byte






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