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CIPDBChina IndustryMetallurgy, Mineral & EnergyTarget Material



Xinkang High Purity 99.9995% Aluminum Planar Target for Vacuum Coating Applications1

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Target MaterialAluminum Sputtering TargetHigh Purity Aluminum

Changsha Xinkang Advanced Materials Co., Ltd.

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Product Description Product DescriptionXinKang Factory Supply Top Ranking 99.99%-99.995% Aluminum Sputtering Target Al Aluminum Al Planar Tubular Sputtering Target Aluminum TargetNameMetal Aluminum Sputtering Target (Al Target)MaterialAluminum Metal MaterialsPurity99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N.SizeD50.8x3mm, 2inch,3inch,Or As RequestColorMetallic ColorShapePlanar/Round/Plate/Rotary/Bar , As Request.SurfacePolished SurfaceDensity2.7g/cm3Melting Point660°CApplicationPVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etcRelated ItemAl,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targetsNoteSupport customize size,shape,purity,different alloy proportion etc.Contact us firstly (Price is based on size and purity)Description:Classified: Our aluminum targets come in both planar and rotating forms, with the planar targets available in various shapes such as round and square. Each design is meticulously crafted to meet exceptional standards. Featuring tubular design, our aluminum targets deliver high utilization efficiency, though they present some processing challenges, ensuring top-notch performance in specialized applications. The final aluminum target products are carefully engineered through processes like extrusion, drawing, straightening, heat treatment, and precision machining, ensuring superior quality and performance. Our aluminum sputtering targets embody the remarkable properties of aluminum, including its silvery-white hue, low density, and exceptional corrosion resistance due to passivation. With a chemical symbol Al and atomic number 13, aluminum stands as a versatile, non-magnetic, and ductile metal. Aluminum and its alloys are indispensable in the aerospace, transportation, and construction industries. Pure aluminum grades like 3N8-4N8 are essential for rolling electrolytic capacitor aluminum foil, lighting fixtures, and data storage. Ultra-pure grades such as 5N-6N are vital for semiconductor devices, optoelectronic storage media, superconducting cable stabilization materials, and space exploration research. Our high-purity aluminum sputtering targets ensure films with superior electrical conductivity and reduced particle formation during the PVD process. Below is a typical Certificate of Analysis for our 5N aluminum sputtering target, showcasing its exceptional quality.Product ParametersApplication: Application: Ideal for an array of sputtering methods including DC two-pole, three-pole, four-stage, RF, target-oriented, ion beam, and magnetron sputtering. This versatile aluminum target can be used to coat reflective films, conductive films, semiconductor films, capacitor films, decorative films, protective films, integrated circuits, and displays. It is the preferred choice for applications requiring dependable film functionality.High-Purity Manufacturing: Aluminum is derived by extracting Al2O3 from bauxite and electrolyzing it in molten cryolite, generally achieving a purity above 99%. However, such purity is insufficient for aluminum target production. The aluminum targets require exceptionally high purity, achieved through segregation, three-layer electrolysis, or combined zone smelting. The highest purity aluminum in China reaches approximately 99.9999% (6N). These high-purity aluminum ingots undergo processes like forging, rolling, and heat treatment to refine the grain structure and increase density, catering to sputtering requirements. Post-deformation, the material undergoes precise mechanical processing to meet the stringent demands for target size and surface quality in vacuum coating machines.Other Alloy Forms of Aluminum Sputtering TargetAluminum alloys include aluminum-silicon, aluminum-copper, aluminum-magnesium, aluminum-zinc, and aluminum-rare earth alloys.Related Products:Ceramic TargetsOxideAI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.SulfideCuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.NitrideAIN, TIN, Si3N4, NbN, TaN, BN, etc.CarbideB4C, SiC, WC, TIC, TaC, etc.FluorideYbF3, MgF2, CaF2, LiF, AIF3, etc.OthersLaB6, MgB2, Sb2Te3, etc.  Alloy TagetsNickel BasedNiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etcIron BasedFeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etcCobalt BasedCoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etcCopper BasedCuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etcAluminum BasedAlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etcOther AlloyWTi, ZnAl, ZnSn  Metal TargetsHigh purity metalNi, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;Rare earth metalSc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etcRefractory metalHf, Zr, Ta, Nb, w, Mo,etcPrecious metalIr, Ru, Pd, Os, etcCompany ProfileFactory:Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd is a distinguished factory that excels in the research, development, production, processing, sales, and service of high-quality metal materials. Our extensive product range includes metal elements, alloys, metal sputtering targets, alloy targets, ceramic targets, evaporation materials, metal powders, alloy powders, and other bespoke metal items. We adhere to rigorous standards such as GB/T, ASTM/B, ASME SB, AMS, DIN, JIS, and cater to specific customer requirements. Our products serve diverse industries including petrochemicals, aerospace, aviation, shipbuilding, energy, healthcare, military, electronics, environmental protection, machinery, instruments, metallurgy, and automotive sectors. Our state-of-the-art 4000 square meter factory in Changsha, Hunan, is ISO9001:2015 and ISO14001:2015 certified, ensuring top-notch quality and environmental management. We are equipped with advanced technology and a team of adept technicians. To guarantee superior quality, we utilize cutting-edge testing instruments including carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers. Our professional technicians, skilled workforce, and advanced equipment enable us to deliver exceptional products and services. Our products are exported to the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Clients highly appreciate our superior quality, competitive pricing, timely delivery, and exceptional after-sales service.CertificationsFactory and EquippmentsPackaging & ShippingFAQ

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Target Material: Xinkang High Purity 99.9995% Aluminum Planar Target for Vacuum Coating Applications
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Versatile Nano Aluminum Oxide Powder for Industrial Use and Manufacturing373byte
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3D Printing 15-45μ M Chromium Nanoparticles1946byte
Molybdenum Target for Vacuum Sputtering Coating1797byte
Best Price Nano Nickel Powder1524byte

Customized Tungsten Product Sputtering Pure Tungsten Target1501byte
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High Quality 98% Purity Vanadium Dioxide CAS 12036-21-41878byte
Boron Powder Standard Laboratory Coating Consumables16223byte

Low Price and High-Quality Nickel Powder 99.99% Metal Powder1702byte
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Oxygen Free Copper Vacuum Coating Target Ofhc Copper Tube Target2761byte
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Xinkang Customized 99.99% High Purity Aluminum Sputtering Target for Vacuum Coating3993byte

OEM Cutstomize Size Special-Shaped Sputtering Target Metal Target1815byte
Lork Custom Csf Alloy Precious Metal Round Cake 99.99% Purity Csf Gold Sputtering Target Disc2607byte
Polished Molybdenum Sputtering Target (99.95% pure)1247byte
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Standard Laboratory Coating Consumables Magnetron Sputtering Coating Targets16734byte

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Cr Rod Sputtering Target for Decoration Film Coating3279byte
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Tantalum Target, Tantalum Plate, Magnetron Sputtering Coating Machine Consumables16745byte
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