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CIPDB › China Industry › Metallurgy, Mineral & Energy › Target Material

China High Purity Zinc Tin Sputtering Target 99.99% Znsn Plate for PVD Deposition¹ Products Supplier or Manufacturer.

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Target Material Zinc Tin Target Zinc Tin Product

Changsha Xinkang Advanced Materials Co., Ltd.

Preview:

Product Description Product:Zinc Tin/ZnSn sputtering targetPurity: 99.95%, 99.99%Size: customizedShape: round or rectangularTechnology: VIMApplication: pvd coating industryPacking: Vacumm sealed, wooden case

Link supplier or manufacturer »

Target Material: High Purity Zinc Tin Sputtering Target 99.99% Znsn Plate for PVD Deposition

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99.9% 50nm, 99.8% 800nm Stannum/Tin Nanoparticles2628byte

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Znse Sputtering Target for PVD Coating1119byte

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Ti Sputtering Titanium Target/Titanium Sputter Target/Vacuum Coating Titanium Target2158byte

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Versatile Nano Aluminum Oxide Powder for Industrial Use and Manufacturing373byte

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3D Printing 15-45μ M Chromium Nanoparticles1946byte

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Customized Tungsten Product Sputtering Pure Tungsten Target1501byte

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99.95% 1-3mm Chromium Cr Granules for Vacuum Coating3509byte

99.99% Pure Zinc Oxide Sputtering Target ZnO Target for Magnetron Coating1177byte

Custom Size Rare Earth Sputtering Target Lanthanum Target2138byte

Lork Custom Purity Tantalum Materials 5n5 Disc for Semiconductor Sputtering Target Pure Tantalum Cake4387byte

High Quality 98% Purity Vanadium Dioxide CAS 12036-21-41878byte

Boron Powder Standard Laboratory Coating Consumables16223byte

Low Price and High-Quality Nickel Powder 99.99% Metal Powder1702byte

High Purity Magnetron Sputtering Nickel Target1403byte

Oxygen Free Copper Vacuum Coating Target Ofhc Copper Tube Target2761byte

Chromium Granule for Vacuum Coating3509byte

99.9% Pure Tial Titanium Aluminum Alloy Sputtering Target for Decoration Coating6802byte

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Xinkang Customized 99.99% High Purity Aluminum Sputtering Target for Vacuum Coating3993byte

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Polished Molybdenum Sputtering Target (99.95% pure)1247byte

High Purity Tin 15/45/75 μ M Stannum Nanopowder at Best Price2626byte

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High Purity 99.999% Tungsten W Target Tungsten Metal Sputtering Target for Coating2870byte

SeAsGeSi Target Selenium As Germanium Silicon Ceramic Sputtering Target for Optical Thin Film Coating3219byte

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X Ray Tube Consumables-Stationary (fixed) Anode10088byte

Cr Rod Sputtering Target for Decoration Film Coating3279byte

High Purity 99.995% Indium in Sputtering Target1652byte

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High Purity 99.9% 60nm, 99.6% 600nm Chromium Nanoparticles1958byte

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99.9% High-Purity High-Quality Copper Powder Suitable for Conductive Ink1871byte

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