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CIPDBChina IndustryMetallurgy, Mineral & EnergyTarget Material



Niv7wt% Nickel Vanadium Alloy Sputter Target1

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Target MaterialNiv Magnetron TargetsNiv7 Sputtering Targets

Changsha Xinkang Advanced Materials Co., Ltd.

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Product Description Product DescriptionXinKang Factory Supply Top-Ranking 99.9%-99.995% Purity NiV Magnetron Nickel Vanadium Sputtering Target NiV7wt% for PVD CoatingNameMetal Nickel Vanadium Alloy Sputtering Targets  (NiV7 Targets)MaterialNickel Vanadium Alloy Metal MaterialsPurity99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5.SizeD50.8x3mm, 10x10x10mm,D3x3mm, 2inch,3inch,Or As RequestColorMetallic ColorShapePellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.SurfacePolished SurfaceDensityNi: 8.902g/cm3 ;  V:6.11g/cm3Melting PointNi: 1453°C; V: 1890°C.ApplicationPVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etcRelated ItemAl,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targetsNoteSupport customize size,shape,purity,different alloy proportion etc.Contact us firstly (Price is based on size and purity)Description:Nickel is a lustrous silver-white metal known for its excellent mechanical strength and ductility. It is insoluble in water and exhibits remarkable resistance to both acids and alkalis. Furthermore, it boasts high-temperature resistance with a melting point of 1455°C and a boiling point of 2730°C. With a density of 8.902g/cm3, nickel finds extensive use in coinage and can be electroplated onto other metals to provide rust prevention.Our NiV sputtering targets are crafted with exceptional purity, offering unparalleled electrical conductivity and minimal particle formation during the PVD process. The following table showcases a typical certificate of analysis for our 3N5 high-purity NiV (93/7wt%) sputtering target, underscoring our commitment to quality and precision.Product ParametersApplication: Nickel boasts exceptional plasticity, corrosion resistance, and magnetic properties. It is used prominently in steel production, nickel-based alloys, electroplating, and battery manufacturing. Additionally, it plays a critical role in military manufacturing sectors, including aircraft and radar production, as well as in diverse civil machinery manufacturing and the electroplating industry.In the realm of integrated circuit fabrication, pure gold is typically employed as an interconnect metal deposited onto silicon wafers. However, gold tends to diffuse into the silicon, creating high-resistance AuSi compounds. This diffusion critically diminishes current density in the wiring, thereby jeopardizing the integrity of the entire wiring system.To mitigate this issue, an adhesive layer is proposed between the gold film and silicon wafers. This adhesive layer is often composed of pure nickel. Nevertheless, diffusion also occurs between the nickel layer and the gold conductive layer, necessitating a barrier layer to prevent such diffusion.Vanadium, with its high melting point and remarkable current density, is selected for the barrier layer deposition. Consequently, nickel sputtering targets, vanadium sputtering targets, and gold sputtering targets are all integral in the fabrication of integrated circuits.Nickel vanadium (NiV) sputtering targets containing 7% vanadium combine the strengths of both nickel and vanadium. This allows for the formation of both adhesive and barrier layers simultaneously. As a non-magnetic material, the NiV alloy facilitates efficient magnetron sputtering processes.Related Products:Company ProfileFactory:Founded in 2014, Changsha Xinkang Advanced Materials Co., Ltd is a professional factory specialized in the meticulous research, innovative development, precision production, expert processing, global sales, and dedicated service of high-quality metal materials. Our extensive product line includes metal elements, alloys, metal sputtering targets, alloy targets, ceramic targets, evaporation materials, metal powders, alloy powders, and other customized metal items. Each product is crafted according to the stringent standards of GB/T, ASTM/B ASME SB, AMS, DIN, JIS, and tailored customer requirements. These products are indispensable in diverse sectors including petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery and instruments, metallurgy, automotive, and more. Our state-of-the-art factory, located in Changsha, Hunan, spans 4,000 square meters and boasts certifications from ISO9001:2015 for quality management and ISO14001:2015 for environmental management. Equipped with cutting-edge technology and staffed by a team of highly skilled technicians and workers, we ensure impeccable product quality through rigorous testing using carbon sulfur instruments, spectrometers, flaw detectors, cupping machines, stiffness testers, and more. Our commitment to excellence has earned us a reputation for high-quality products, competitive pricing, punctual delivery, and exceptional after-sales service. Our products have gained acclaim and are in demand across the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya.CertificationsFactory and EquippmentsPackaging & ShippingFAQ1.Are you trading company or manufacturer?Xinkang: We are a professional manufacturer specializing in advanced materials for over a decade. Our expertise and experience have cemented our reputation in the industry.2.How long is your delivery time?Xinkang: For regular sizes or samples, we ensure shipment within 3-5 days. For bulk orders, our lead time extends to 15 days, ensuring meticulous quality control.3.Do you have MOQ?Xinkang: No, we support the needs of all clients and offer samples without any Minimum Order Quantity requirement.4.What is your payment method?Xinkang: We accept T/T in advance, PayPal, Western Union, and other convenient payment methods to suit our customers' preferences.Welcome to contact us at any time!

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Target Material: Niv7wt% Nickel Vanadium Alloy Sputter Target
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99.95% Moly Tube Target Sputtering Molybdenum Target1604byte
Lork Custom ASTM B393 Purity Niobium Materials 5n5 Disc for Semiconductor Sputtering Target Pure Niobium Cake4068byte
99.9% 50nm, 99.8% 800nm Stannum/Tin Nanoparticles2628byte
Molybdenum Disc Target for Vacuum Sputtering Coating1807byte

Laboratory Equipment Coating Consumables Nano Iridium Powder, Nano Tungsten Powder, Nano Nickel Powder16648byte
99.9% Low-Cost High-Purity Cobalt Powder1524byte
High-Quality Rotary Zirconium Sputtering Target Zirconium Tube Target1992byte
99.99% High Purity Gold Tin Alloy Sputtering Target1402byte
Chromium Metal Particle Chromium Granule3509byte

Metal Tizr Alloy Sputter Titanium Zirconium Sputtering Target for Coating5854byte
Silicon Carbide Sic High Purity Coated Ceramic Target Magnetron Sputtering Processing Customization2136byte
Te Target Tellurium Sputtering Target for Solar Photovoltaics3245byte
High Quality Germanium Ge Sputtering Target for Vacuum PVD Coating1654byte
Anode Copper Caps, Rotating Anode Targets for X Ray Tube Insert Parts6717byte

Znse Sputtering Target for PVD Coating1119byte
Black Round Yb High-Purity Sputtering Metal Target for Flat Panel Display2476byte
Ti Sputtering Titanium Target/Titanium Sputter Target/Vacuum Coating Titanium Target2158byte
99.99% Chromium Sputtering Target Chromium Coating Chromium Target1361byte
Lork Custom High Purity Nickel Alloy 4n5 Round Cake for Semiconductor Sputtering Target Disc3650byte

Versatile Nano Aluminum Oxide Powder for Industrial Use and Manufacturing373byte
Laboratory Equipment Coating Consumables Nano Aluminum Oxide Powder16749byte
3D Printing 15-45μ M Chromium Nanoparticles1946byte
Molybdenum Target for Vacuum Sputtering Coating1797byte
Best Price Nano Nickel Powder1524byte

Customized Tungsten Product Sputtering Pure Tungsten Target1501byte
Sputtering Target1697byte
Aluminum Titanium Alloy Cathode Magnetron Sputtering Target Alti Alloy Target919byte
Nickel Target 99.99 High Purity Sputtering Plane Target1403byte
99.95% 1-3mm Chromium Cr Granules for Vacuum Coating3509byte

99.99% Pure Zinc Oxide Sputtering Target ZnO Target for Magnetron Coating1177byte
Custom Size Rare Earth Sputtering Target Lanthanum Target2138byte
Lork Custom Purity Tantalum Materials 5n5 Disc for Semiconductor Sputtering Target Pure Tantalum Cake4387byte
High Quality 98% Purity Vanadium Dioxide CAS 12036-21-41878byte
Boron Powder Standard Laboratory Coating Consumables16223byte

Low Price and High-Quality Nickel Powder 99.99% Metal Powder1702byte
High Purity Magnetron Sputtering Nickel Target1403byte
Oxygen Free Copper Vacuum Coating Target Ofhc Copper Tube Target2761byte
Chromium Granule for Vacuum Coating3509byte
99.9% Pure Tial Titanium Aluminum Alloy Sputtering Target for Decoration Coating6802byte

99.99% Tungsten Titanium Sputtering Target, Wti10 Square Sputtering Target Manufacturer2915byte
Molybdenum Anode Target for X Ray Tube6717byte
Metal Sputtering Target Germanium Ge Inexpensive Price1654byte
V2O5 Target Vanadium Oxide Ceramic Target For LCD3198byte
Xinkang Customized 99.99% High Purity Aluminum Sputtering Target for Vacuum Coating3993byte

OEM Cutstomize Size Special-Shaped Sputtering Target Metal Target1815byte
Lork Custom Csf Alloy Precious Metal Round Cake 99.99% Purity Csf Gold Sputtering Target Disc2607byte
Polished Molybdenum Sputtering Target (99.95% pure)1247byte
High Purity Tin 15/45/75 μ M Stannum Nanopowder at Best Price2626byte
Standard Laboratory Coating Consumables Magnetron Sputtering Coating Targets16734byte

High Purity Crystalline Tungsten Powder Is Suitable for Thermal Spraying Industry3076byte
High Quality Titanium Cathode Magnetron Sputtering Coating Target919byte
High Purity Chromium Target for Vacuum/PVD Coating1403byte
Optical Vacuum Coating Material Silicon Si Granule3492byte
99.99% High Purity Cofe Cobalt Iron Alloy Sputtering Target for Thin Film Coating6828byte

2-4inch 99.95% Rhodium Target Manufacture1687byte
Professional Manufacturer for Rotary Anode Sputtering Target, Molybdenum Rhenium Tungsten Composite Rotating Anode Target6717byte
Mn Target Manganese Sputtering Target for Optical Thin Film Coating/PVD Film Coating3209byte
Manufacture Value Price Titanium Ti Sputtering Target China1654byte
Custom Size Rare Earth Special-Shaped Sputtering Metal Target for Solar Cell1815byte

Arc Cathode Zirconium Target for Precision Magnetron Sputtering Applications1992byte
Silicon Granule for Used as a Semiconductor Material3492byte
99.99% Cr3c2 Targets Chromium Carbide Ceramic Sputtering Targets6010byte
High Quality Molybdenum Copper Bonding X Ray Medical Device Part Rotors7851byte
High Purity 99.999% Tungsten W Target Tungsten Metal Sputtering Target for Coating2870byte

SeAsGeSi Target Selenium As Germanium Silicon Ceramic Sputtering Target for Optical Thin Film Coating3219byte
Durable Optical Coating Rare Earth Yttrium Sputtering Metal Target2232byte
Metal Sputtering Target Tin Stannum Sn Inexpensive Price1652byte
PVD Target 3n Fe2o3 Disc Iron Trioxide Sputtering Target with Copper Backing Plate1636byte
High Purity of Zirconium Tube Sputtering Target Zirconium Pipe Zirconium Magnetron Vacuum Coating Target1992byte

High Purity Silicon Nitride Target Material1402byte
99.95% Purity Chromium Pellets with 1~3mm Irregular Shape3509byte
3n5, 4n Alsi Aluminum Silicon Alloy Sputtering Target for Semiconductor Use6739byte
99.95% Wholesale China Pure Nb Metal Sputtering Target Niobium Sheet1761byte
X Ray Tube Consumables-Stationary (fixed) Anode10088byte

Cr Rod Sputtering Target for Decoration Film Coating3279byte
High Purity 99.995% Indium in Sputtering Target1652byte
High Quality Yttrium Oxide Y2o3 Sputtering Target Coating Material2232byte
Customized Size Znal95/5wt% Zinc Aluminum Alloy Sputter Target for Coating4535byte
High Purity 99.9% 60nm, 99.6% 600nm Chromium Nanoparticles1958byte

Tantalum Target, Tantalum Plate, Magnetron Sputtering Coating Machine Consumables16745byte
99.9% High-Purity High-Quality Copper Powder Suitable for Conductive Ink1871byte
Copper Target PVD Vacuum Sputtering Target1402byte
Titanium Aluminum/Tial / Cr/Zr/Ti Target for PVD Coating Machine/Plant/Equipment/System919byte
High Quality 1-3mm High Purity 99.95% Cr Chromium Granule for Coating3509byte






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