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CIPDBChina IndustryMetallurgy, Mineral & EnergyTarget Material



Custom Copper Targets with 99.9% Purity for Precision Applications1

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Target MaterialTitanium Metal TargetsCopper Plate Planar Targets

Changsha Xinkang Advanced Materials Co., Ltd.

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Product Description Product DescriptionXinKang Factory Supply: Top Ranking 4N 99.99% High Purity Cuprum/Cu/Copper Planar Target for PVD Coating - Ideal for Evaporation Materials Copper TargetNameMetal Copper Sputtering Target (Cu Target)MaterialCopper Metal MaterialsPurity99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N,SizeD50.8x3mm, 2inch,3inch,Or As RequestColorMetallic ColorShapePlanar/Round/Plate/Rotary/Bar , As Request.SurfacePolished SurfaceDensity8.954g/cm3Melting Point1083°CApplicationPVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etcRelated ItemAl,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targetsNoteSupport customize size,shape,purity,different alloy proportion etc.Contact us firstly (Price is based on size and purity)Description:Our Copper sputtering target retains all the remarkable properties of pure copper (Cu). Copper, symbolized as Cu (from the Latin: cuprum) and bearing the atomic number 29, is renowned for its softness, malleability, and ductility. It boasts exceptional thermal and electrical conductivity. A freshly exposed surface of pure copper radiates a pinkish-orange hue. Copper serves multifarious purposes: as a thermal and electrical conductor, a key building material, and a pivotal component in various metal alloys. Produced through advanced melting technology, our Copper Sputtering Targets are indispensable in semiconductor applications, decorative coatings, and advanced packaging fields.We specialize in producing copper sputtering targets with an extraordinary purity range of 99.9% to 99.9999%, boasting oxygen content as low as <1ppm. These targets find critical applications in display screens, touch screen wiring, protective films, solar light-absorbing layers, and semiconductor wiring. Our portfolio includes planar copper sputtering targets (up to G8.5 generation) and copper rotary targets, predominantly used in the touch screen industry. Overcoming the challenge of grain breakage, we employ large deformation processing and meticulous twin growth control to achieve a fine and uniform microstructure. This ensures lower erosion rates and minimizes particle formation sensitivity during sputtering, delivering unmatched performance and reliability.Product ParametersApplication: Preparation Process of Copper Sputtering TargetMaterial Preparation - Electrolytic Purification & Electron Beam Melting - Chemical Analysis - Forging - Rolling - Annealing - Metallographic Inspection - Machining - Dimensional Inspection - Cleaning - Final Inspection - PackagingCopper Sputtering Target and Its Preparation MethodThe copper undergoes purification from 99.95% to 99.99%, 99.999%, and up to the highest purity of 99.9999% (6N) through multiple electrolysis and regional smelting processes. As the purest copper available in China, these copper ingots serve as the raw material. Through forging, rolling, and heat treatment, the crystal grains in the copper ingots are refined and density is increased to meet the stringent requirements of copper targets for sputtering. Post-deformation, the high-purity copper material is meticulously machined to achieve the precision and surface quality necessary for the desired target size in vacuum coating machines.Other Alloy Forms of Copper Sputtering TargetOur portfolio includes Tin-Copper, ***-Copper, Tungsten-Copper, Silver-Copper, Copper-Phosphorus, Nickel-Copper alloy targets, and many more.Related Products:Ceramic TargetsOxideAI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.SulfideCuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.NitrideAIN, TIN, Si3N4, NbN, TaN, BN, etc.CarbideB4C, SiC, WC, TIC, TaC, etc.FluorideYbF3, MgF2, CaF2, LiF, AIF3, etc.OthersLaB6, MgB2, Sb2Te3, etc.  Alloy TagetsNickel BasedNiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etcIron BasedFeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etcCobalt BasedCoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etcCopper BasedCuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etcAluminum BasedAlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etcOther AlloyWTi, ZnAl, ZnSn  Metal TargetsHigh purity metalNi, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;Rare earth metalSc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etcRefractory metalHf, Zr, Ta, Nb, w, Mo,etcPrecious metalIr, Ru, Pd, Os, etcCompany ProfileFactory:Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd is a leading innovator in the research, development, production, processing, sales, and service of premium metal materials. Our extensive product range includes Metal Elements, Alloys, Metal Sputtering Targets, Alloy Targets, Ceramic Targets, Evaporation Materials, Metal Powders, Alloy Powders, and other bespoke metal products. We adhere to stringent standards such as GB/T, ASTM/B, ASME SB, AMS, DIN, and JIS, ensuring our offerings meet the precise requirements of our clients. Our products are pivotal across a multitude of industries, including petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instruments, metallurgy, and automotive sectors. Located in the heart of Changsha, Hunan, our state-of-the-art factory spans 4000 square meters and is certified with ISO9001:2015 for quality management and ISO14001:2015 for environmental management. Our facility is equipped with advanced technology and a skilled workforce, including professional technicians and trained workers. To guarantee superior quality, we utilize cutting-edge testing instruments such as carbon-sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers. Our commitment to excellence has earned us a global clientele, with our products being exported to the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Customers highly value our exceptional product quality, competitive pricing, timely delivery, and outstanding after-sales service.CertificationsFactory and EquippmentsPackaging & ShippingFAQ

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Target Material: Custom Copper Targets with 99.9% Purity for Precision Applications
Pure 5n Cu Copper Cathode Sputtering Target2429byte
99.95% Moly Tube Target Sputtering Molybdenum Target1604byte
Lork Custom ASTM B393 Purity Niobium Materials 5n5 Disc for Semiconductor Sputtering Target Pure Niobium Cake4068byte
99.9% 50nm, 99.8% 800nm Stannum/Tin Nanoparticles2628byte
Molybdenum Disc Target for Vacuum Sputtering Coating1807byte

Laboratory Equipment Coating Consumables Nano Iridium Powder, Nano Tungsten Powder, Nano Nickel Powder16648byte
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High-Quality Rotary Zirconium Sputtering Target Zirconium Tube Target1992byte
99.99% High Purity Gold Tin Alloy Sputtering Target1402byte
Chromium Metal Particle Chromium Granule3509byte

Metal Tizr Alloy Sputter Titanium Zirconium Sputtering Target for Coating5854byte
Silicon Carbide Sic High Purity Coated Ceramic Target Magnetron Sputtering Processing Customization2136byte
Te Target Tellurium Sputtering Target for Solar Photovoltaics3245byte
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Anode Copper Caps, Rotating Anode Targets for X Ray Tube Insert Parts6717byte

Znse Sputtering Target for PVD Coating1119byte
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Ti Sputtering Titanium Target/Titanium Sputter Target/Vacuum Coating Titanium Target2158byte
99.99% Chromium Sputtering Target Chromium Coating Chromium Target1361byte
Lork Custom High Purity Nickel Alloy 4n5 Round Cake for Semiconductor Sputtering Target Disc3650byte

Versatile Nano Aluminum Oxide Powder for Industrial Use and Manufacturing373byte
Laboratory Equipment Coating Consumables Nano Aluminum Oxide Powder16749byte
3D Printing 15-45μ M Chromium Nanoparticles1946byte
Molybdenum Target for Vacuum Sputtering Coating1797byte
Best Price Nano Nickel Powder1524byte

Customized Tungsten Product Sputtering Pure Tungsten Target1501byte
Sputtering Target1697byte
Aluminum Titanium Alloy Cathode Magnetron Sputtering Target Alti Alloy Target919byte
Nickel Target 99.99 High Purity Sputtering Plane Target1403byte
99.95% 1-3mm Chromium Cr Granules for Vacuum Coating3509byte

99.99% Pure Zinc Oxide Sputtering Target ZnO Target for Magnetron Coating1177byte
Custom Size Rare Earth Sputtering Target Lanthanum Target2138byte
Lork Custom Purity Tantalum Materials 5n5 Disc for Semiconductor Sputtering Target Pure Tantalum Cake4387byte
High Quality 98% Purity Vanadium Dioxide CAS 12036-21-41878byte
Boron Powder Standard Laboratory Coating Consumables16223byte

Low Price and High-Quality Nickel Powder 99.99% Metal Powder1702byte
High Purity Magnetron Sputtering Nickel Target1403byte
Oxygen Free Copper Vacuum Coating Target Ofhc Copper Tube Target2761byte
Chromium Granule for Vacuum Coating3509byte
99.9% Pure Tial Titanium Aluminum Alloy Sputtering Target for Decoration Coating6802byte

99.99% Tungsten Titanium Sputtering Target, Wti10 Square Sputtering Target Manufacturer2915byte
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Metal Sputtering Target Germanium Ge Inexpensive Price1654byte
V2O5 Target Vanadium Oxide Ceramic Target For LCD3198byte
Xinkang Customized 99.99% High Purity Aluminum Sputtering Target for Vacuum Coating3993byte

OEM Cutstomize Size Special-Shaped Sputtering Target Metal Target1815byte
Lork Custom Csf Alloy Precious Metal Round Cake 99.99% Purity Csf Gold Sputtering Target Disc2607byte
Polished Molybdenum Sputtering Target (99.95% pure)1247byte
High Purity Tin 15/45/75 μ M Stannum Nanopowder at Best Price2626byte
Standard Laboratory Coating Consumables Magnetron Sputtering Coating Targets16734byte

High Purity Crystalline Tungsten Powder Is Suitable for Thermal Spraying Industry3076byte
High Quality Titanium Cathode Magnetron Sputtering Coating Target919byte
High Purity Chromium Target for Vacuum/PVD Coating1403byte
Optical Vacuum Coating Material Silicon Si Granule3492byte
99.99% High Purity Cofe Cobalt Iron Alloy Sputtering Target for Thin Film Coating6828byte

2-4inch 99.95% Rhodium Target Manufacture1687byte
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Mn Target Manganese Sputtering Target for Optical Thin Film Coating/PVD Film Coating3209byte
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Custom Size Rare Earth Special-Shaped Sputtering Metal Target for Solar Cell1815byte

Arc Cathode Zirconium Target for Precision Magnetron Sputtering Applications1992byte
Silicon Granule for Used as a Semiconductor Material3492byte
99.99% Cr3c2 Targets Chromium Carbide Ceramic Sputtering Targets6010byte
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High Purity 99.999% Tungsten W Target Tungsten Metal Sputtering Target for Coating2870byte

SeAsGeSi Target Selenium As Germanium Silicon Ceramic Sputtering Target for Optical Thin Film Coating3219byte
Durable Optical Coating Rare Earth Yttrium Sputtering Metal Target2232byte
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PVD Target 3n Fe2o3 Disc Iron Trioxide Sputtering Target with Copper Backing Plate1636byte
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High Purity Silicon Nitride Target Material1402byte
99.95% Purity Chromium Pellets with 1~3mm Irregular Shape3509byte
3n5, 4n Alsi Aluminum Silicon Alloy Sputtering Target for Semiconductor Use6739byte
99.95% Wholesale China Pure Nb Metal Sputtering Target Niobium Sheet1761byte
X Ray Tube Consumables-Stationary (fixed) Anode10088byte

Cr Rod Sputtering Target for Decoration Film Coating3279byte
High Purity 99.995% Indium in Sputtering Target1652byte
High Quality Yttrium Oxide Y2o3 Sputtering Target Coating Material2232byte
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High Purity 99.9% 60nm, 99.6% 600nm Chromium Nanoparticles1958byte

Tantalum Target, Tantalum Plate, Magnetron Sputtering Coating Machine Consumables16745byte
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High Quality 1-3mm High Purity 99.95% Cr Chromium Granule for Coating3509byte






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