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CIPDB › China Industry › Metallurgy, Mineral & Energy › Target Material

99.5% Pure Tantalum Nitride Deposition Material Tan Target for Thin Film Coating¹

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Target Material High Purity Tantalum Nitride PVD Tantalum Nitride Target

Changsha Xinkang Advanced Materials Co., Ltd.

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Product Description Product Name: High Purity Tantalum Nitride Sputtering Target TaNCategory: Target MaterialKeywords: Tantalum nitride target, Sputtering target, Thin film deposition, PVD coating material, Semiconductor industry, High purity material, Ceramic target material, Vacuum deposition, Thin film technology, Physical vapor depositionDescription: Elevate your cutting-edge thin film technology with our High Purity Tantalum Nitride Sputtering Target. Expertly crafted for the semiconductor industry, this top-tier ceramic target material excels in PVD coating applications. Boasting a high purity composition, our tantalum nitride target guarantees exceptional performance in vacuum deposition processes. Achieve precise, uniform thin film deposition effortlessly with the superior quality of this sputtering target. Boost the efficiency and effectiveness of your PVD coating operations with our tantalum nitride sputtering target. Invest in unparalleled excellence for all your thin film technology requirements.

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Target Material: 99.5% Pure Tantalum Nitride Deposition Material Tan Target for Thin Film Coating

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Versatile Nano Aluminum Oxide Powder for Industrial Use and Manufacturing373byte

Laboratory Equipment Coating Consumables Nano Aluminum Oxide Powder16749byte

3D Printing 15-45μ M Chromium Nanoparticles1946byte

Molybdenum Target for Vacuum Sputtering Coating1797byte

Best Price Nano Nickel Powder1524byte

Customized Tungsten Product Sputtering Pure Tungsten Target1501byte

Sputtering Target1697byte

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99.95% 1-3mm Chromium Cr Granules for Vacuum Coating3509byte

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Custom Size Rare Earth Sputtering Target Lanthanum Target2138byte

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High Quality 98% Purity Vanadium Dioxide CAS 12036-21-41878byte

Boron Powder Standard Laboratory Coating Consumables16223byte

Low Price and High-Quality Nickel Powder 99.99% Metal Powder1702byte

High Purity Magnetron Sputtering Nickel Target1403byte

Oxygen Free Copper Vacuum Coating Target Ofhc Copper Tube Target2761byte

Chromium Granule for Vacuum Coating3509byte

99.9% Pure Tial Titanium Aluminum Alloy Sputtering Target for Decoration Coating6802byte

99.99% Tungsten Titanium Sputtering Target, Wti10 Square Sputtering Target Manufacturer2915byte

Molybdenum Anode Target for X Ray Tube6717byte

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V2O5 Target Vanadium Oxide Ceramic Target For LCD3198byte

Xinkang Customized 99.99% High Purity Aluminum Sputtering Target for Vacuum Coating3993byte

OEM Cutstomize Size Special-Shaped Sputtering Target Metal Target1815byte

Lork Custom Csf Alloy Precious Metal Round Cake 99.99% Purity Csf Gold Sputtering Target Disc2607byte

Polished Molybdenum Sputtering Target (99.95% pure)1247byte

High Purity Tin 15/45/75 μ M Stannum Nanopowder at Best Price2626byte

Standard Laboratory Coating Consumables Magnetron Sputtering Coating Targets16734byte

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Professional Manufacturer for Rotary Anode Sputtering Target, Molybdenum Rhenium Tungsten Composite Rotating Anode Target6717byte

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Custom Size Rare Earth Special-Shaped Sputtering Metal Target for Solar Cell1815byte

Arc Cathode Zirconium Target for Precision Magnetron Sputtering Applications1992byte

Silicon Granule for Used as a Semiconductor Material3492byte

99.99% Cr3c2 Targets Chromium Carbide Ceramic Sputtering Targets6010byte

High Quality Molybdenum Copper Bonding X Ray Medical Device Part Rotors7851byte

High Purity 99.999% Tungsten W Target Tungsten Metal Sputtering Target for Coating2870byte

SeAsGeSi Target Selenium As Germanium Silicon Ceramic Sputtering Target for Optical Thin Film Coating3219byte

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High Purity of Zirconium Tube Sputtering Target Zirconium Pipe Zirconium Magnetron Vacuum Coating Target1992byte

High Purity Silicon Nitride Target Material1402byte

99.95% Purity Chromium Pellets with 1~3mm Irregular Shape3509byte

3n5, 4n Alsi Aluminum Silicon Alloy Sputtering Target for Semiconductor Use6739byte

99.95% Wholesale China Pure Nb Metal Sputtering Target Niobium Sheet1761byte

X Ray Tube Consumables-Stationary (fixed) Anode10088byte

Cr Rod Sputtering Target for Decoration Film Coating3279byte

High Purity 99.995% Indium in Sputtering Target1652byte

High Quality Yttrium Oxide Y2o3 Sputtering Target Coating Material2232byte

Customized Size Znal95/5wt% Zinc Aluminum Alloy Sputter Target for Coating4535byte

High Purity 99.9% 60nm, 99.6% 600nm Chromium Nanoparticles1958byte

Tantalum Target, Tantalum Plate, Magnetron Sputtering Coating Machine Consumables16745byte

99.9% High-Purity High-Quality Copper Powder Suitable for Conductive Ink1871byte

Copper Target PVD Vacuum Sputtering Target1402byte

Titanium Aluminum/Tial / Cr/Zr/Ti Target for PVD Coating Machine/Plant/Equipment/System919byte

High Quality 1-3mm High Purity 99.95% Cr Chromium Granule for Coating3509byte

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