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Chromium Sputtering Target for Magnetron Sputtering1
Target MaterialChromium Sputtering TargetChromium Target
Changsha Xinkang Advanced Materials Co., Ltd.
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Product Description Features of Chromium Sputtering TargetsChemical Composition: pure CrAvailable Purity: 2N5, 2N8, 3N, 3N5Production Technology: HIPShapes: planar targets, rotary targetsAverage Grain Size: < 100umApplication of Chromium Sputtering TargetsChromium Sputtering Target are produced by HIP technology, usually used for decorative coating to obtain metal color film. With up to 3N5 purity, uniform grain size, lower impurity content, end user can obtain good hardness, high brightness, corrosion and oxidation resistant color without fading for a long time. We have been supplying chromium sputtering targets, chromium arc cathodes for manufacturers of watch, sanitary ware, car mirrors, etc, which are suitable for various magnetron sputtering machines and ionic plating machines.
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