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ITO Conductive Glass Magnetron Sputtering Vacuum Coating Machine ITO Glass Coating PVD Sputtering System1
Glass Machine, ITO Coating Machine, ITO Glass Coating Machine
Xiangtan Hondson Coating Technology Co., Ltd.
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Product Description ITO Conductive Glass Magnetron Sputtering Vacuum Coating Machine ITO Glass Coating PVD Sputtering System"Sputtering" is a vacuum process used to deposit very thin films on substrates. The large area horizontal on-line sputtering system is designed to continuously coat the metallic or compound layers on glass sheets for the production of reflective glass. The machine is fully automatic controlled and glass is continuously moving and coating from one end of the machine to the other. The available film series are solar control reflective glass, Low-e glass and mirror for a wide variety of commercial and scientific purposes.It is performed by applying a high voltage across a low-pressure gas (usually argon at about 5 millitorr) to create a "plasma," which consists of electrons and gas ions in a high-energy state. (This is sometimes called a "glow discharge" process because the plasma emits a colorful halo of light.) During sputtering, energized plasma ions strike a "target", composed of the desired coating material, and cause atoms from that target to be ejected with enough energy to travel to, and bond with, the substrate.During sputtering, energized plasma ions strike a "target", composed of the desired coating material, and cause atoms from that target to be ejected with enough energy to travel to, and bond with the substrate.The magnetron sputtering glass coating line equips the latest technology in China for DC cathode, Twin-Mag cathode and Circle Rotary cathode. The machine could be applied widely on the field of reflective glass, Low-E glass, home mirror, automobile rear mirror, solar reflector, solar absorb, ITO coating, etc. the machine features continuous operation, mass capacity, fully automatical and stabile in quality, it is the good solution to instead of traditional coating processSputtering lineStructure of the magnetron sputtering coating line The vacuum coating production line is usually connected by more than three vacuum chambers to form a continuous working vacuum coating machine.Advantages of this vacuum coating line are:Extremely high vacuum, high film qualityCoating film quality is stableHigh productivityHigh degree of automation, fewer operator requirementsThe vacuum coating line is mainly used for film coating on flat glass, acrylic, PC, PET substrates, various metal films, dielectric films, dielectric metal composite films, transparent conductive films and other film applications.The industries involved in the vacuum coating line include the surface coating of plastic panels and display screens in mobile phones, electronics, home appliances and other industries.The vacuum coating production line adopts molecular pump or diffusion pump to form advanced design with atmosphere isolation. The equipment uses turbo floating molecular pump to obtain high efficiency isolation, stable pumping speed and uniform gas distribution. In the case of pumping with a diffusion pump, the vacuum pumping rate is high and the equipment production cost is lower. Vertical magnetron sputtering coating lineA normally complete continuous magnetron sputtering production line has a total of fifteen vacuum chambers, one for the chamber, one for the unload chamber, one for the buffer chamber, one for the unload buffer, one for the transfer chamber, and one for the unload chamber. Two transfer chambers; seven sputter coating chambers; four sputtering chambers can be installed at the same time in each sputter coating chamber; the high vacuum chamber is separated by a plug-in valve, and multi-function coating can be achieved by changing the atmosphere isolation effect; substrate rack operation The track uses a magnetic guided drive; the device is equipped with a turbo-buoy molecular pump and a mechanical pump for stable pumping speed and uniform gas distribution. Horizontal magnetron sputtering coating lineThe company can provide design according to user requirements, provide a full set of equipment, responsible for the process, according to "turnkey" engineering services. Magnetron sputtering cathodes Accorinf to different technical requirements of each customers, we can design different types of magnetron sputtering cathodes for the machine. This is the coating system of the machine. You can load different raw material to the cathodes for different coatings. Technical Spcifications Chamber typeVertical and horizontal method of multi-chamberApplied materialGlass and Wafer, other plastic, metal materialsSubstrate sizeVertical type2,200mm x 2,500mmHorizontal type1,500mm x 1,800mmTact time60 sec or less (Static method) 35 sec or less (Dynamic method)Coating sourceSputter sourceRotary cathode, Planar cathodeThermal sourceCrucible, E-beamCoating materialMetal materialAl, Ti, Cr, Cu, NiCr, Ni, Ag, other metal materialReactive materialTiO2, Nb2O5, SiO2, TIO, SiAlOx, MoOx, other nitride / oxide materialPower supplyDC, Pulse DC, MFThickness uniformity±10% or less (Static film) ±5% or less (Moving film)Measuring instrumentSheet resistance, optic (Transmittance, reflectance, color-difference meter),plasma emission monitor, RGAHousehold appliances fieldDecorative coating on household products and exterior of mobile devicesEnergy fieldArchitectural window glass, solar cellOther industrial fieldMetal thin film and oxide thin film, multi-layered thin film coating based application field Company InformationContactIn order to help you choose the best suitable PVD coating machine, please try to reply my questions below, thanks for your cooperation.Q1: What is your product, and the max. dimension?Q2: The size of your processing material, your desired daily production capacity?.
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