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Bismuth Magnetron Sputtering Target for PVD Coating1
Target MaterialBismuth Coating MaterialBismuth Sputter Target
Changsha Xinkang Advanced Materials Co., Ltd.
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Product Description Thin film coating material bismuth sputtering target Product: bismuth sputtering targetPurity: 99.99%-99.999%Size: customizedShape: Planar Technology: Vacuum MeltingPacking: Vacumm sealed, wooden case Bismuth Sputtering Targets are produced by melting technology, usually used for R&D purpose. As the melting point of this materials is very low, you should be very careful once you bond it with copper backing plate.FeaturesChemical Composition: pure BiAvailable Purity: 4N, 5NProduction Technology: melting Shapes: planar targets, 1" to 8" diameterCompany Profile:Since 2014Specializing in high purity sputtering targets.Leader manufacturer of sputtering materials in China.Qualified the world certificates such as ISO9001:2008 and SGS.Comprehensive in R&D, manufacturing, and sales on thin film materials.Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.OUR ADVANTAGE1,Many years manufacturing & exporting experience.2 Strict & complete QC systerm3,Perfect after sale systermOUR SERVICEProfessional and efficientWe own a strong teamwork of professional R&D team,manufacturing team, sales team and after-sales service team.Provide you 12 hours fastest service.
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