Metal Alloy Niv Material Nickel Vanadium Magnetron Sputtering Target¹

Product Description                             Thin film coating material NiV sputtering target   Product: NiV 93/7wt%, other composition can be customizedPurity:  99.9%-99.95%Size:  customizedShape:  Planar and rotaryTechnology:  Vacuum MeltingApplication:  semiconductor field to deposit barrier or adhesion layersPacking:  Vacumm sealed, wooden case     Nickel vanadium Sputtering Targets are produced by vacuum melting technology,they are usually applied for semiconductor field to deposit barrier or adhesion layers,and also applied for display and micro-electronic fields. Our factory have 10 yearsmore production experience of nickel vanadium targets, with up to 4N purity,special annealing treatment, uniform and fine grain size, lower oxygen content,our customers can obtain constant erosion rates as well as high purity andhomogeneous thin film coating during PVD process.FeaturesChemical Composition: NiV 93/7wt%, other composition can be customizedSegregation of weight: +/-0.5wt%Production Technology: meltingShapes: planar targets, rotary targetsAverage Grain Size: < 100umCompany Profile: Since 2014Specializing in high purity sputtering targets.Leader manufacturer of sputtering materials in China.Qualified the world certificates such as ISO9001:2008 and SGS.Comprehensive in R&D, manufacturing, and sales on thin film materials.Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.OUR ADVANTAGE1,Many years manufacturing & exporting experience.2 Strict & complete QC systerm3,Perfect after sale systerm  

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