High Purity 99.99% & 99.999% Tungsten Sputtering Target for Thin Film Coating, Wolfram¹

Product Description Product DescriptionApplication:High-purity tungsten targets, high-purity tungsten-titanium alloy targets, and tungsten-silicon composite targets are usually applied by magnetron sputtering to produce various complex and high-performance thin film materials. Because high-purity tungsten or ultra-pure tungsten (5 N or 6 N) has high resistance to electron migration, high temperature stability, and the ability to form stable silicides, it is often used as a thin film in the electronics industry as a gate, connection, transition and Barrier metal.Ultra-high-purity tungsten and its silicides are also used in ultra-large-scale integrated circuits as resistance layers, diffusion barriers, etc., and as gate materials and connection materials in metal oxide semiconductor transistors.Tungsten-titanium alloy sputtering targets are often used to make transition metal layers of thin-film solar cells. Products Show        Company ProfileOur Service FAQQ: Are you trading company or manufacturer ?A: We are factory.Q: How long is your delivery time?A: Generally it is 3-7 days if the goods are in stock. or it is 15-20 days if the goods are not in stock, it is according toquantity.Q: Do you provide samples ? is it free or extra ?A: Yes, we could offer the sample, but need pay the cost of sample and freight since our product is high value.Q: What is your terms of payment ?A: Payment<=1000USD, 100% in advance. Payment>=1000USD, 30% T/T in advance ,balance before shippment.If you have another question, pls feel free to contact us as below: 

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