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High Purity 99.9%- 99.99% Ruo2 Target, 1-10inch Ruthenium Dioxide Sputtering Target1
Target Material1-10inch Ruthenium Dioxide Sputtering TargetRuo2 TargetRuthenium Dioxide Sputtering Target
Rheniumet Ltd.
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Product Description Product DescriptionHigh density: hot pressing equipment technical modification target material, resulting in density increased to 90-95% High purity: special raw material powder, low impurity content purity up to 99.9%min High uniformity: repeatedly check sintering parameters temperature control uniformity, high material consistencyMain Technical Specifications:Product detailsPhysical propertyTechnical indexNameRuthenium dioxide targetDensity ratio90-95%ElementRu02ColorDark blueSizeCustom-madeSurface roughnessRa3. 2Density6. 97g/cm3Theoretical density ratio>90%Melting point1200oCPurity99.9%~99.99% Tolerance±0.1~0.2mm OtherProduction ProcessVacuum hot pressing/hot isostatic pressingPlace of originHunan ZhuzhouPackageVacuumminimum order quantity1pieceDelivery cycle7-30DaysApplicantionAerospace, biomedical, military, automotive, electronics, new energy, integrated circuits, information storage, etcDetailed PhotosCompany Profile Our Services FAQQ: Are you trading company or manufacturer ?A: We are factory.Q: How long is your delivery time?A: Generally it is 5-10 days if the goods are in stock. or it is 15-20 days if the goods are not in stock, it is according to quantity.Q: Do you provide samples ? is it free or extra ?A: Yes, we could offer the sample for free charge but do not pay the cost of freight.Q: What is your terms of payment ?A: Payment<=1000USD, 100% in advance. Payment>=1000USD, 30% T/T in advance ,balance before shippment.
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