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CIPDB › China Industry › Metallurgy, Mineral & Energy › Target Material

High Pure 99.99% 99.995% Nickel Magnetron Sputtering Target for Advanced Coatings¹

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Target Material Nickel Sputtering Target Nickel Target

Changsha Xinkang Advanced Materials Co., Ltd.

Preview:

Product Description Product:Nickel sputtering targetPurity:99.99%, 99.995%Size:customizedShape:rectangular or roundTechnology:VIMApplication:pvd coating industryPacking:Vacumm sealed package inside, export carton or wooden case outside

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Target Material: High Pure 99.99% 99.995% Nickel Magnetron Sputtering Target for Advanced Coatings

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Ti Sputtering Titanium Target/Titanium Sputter Target/Vacuum Coating Titanium Target2158byte

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Versatile Nano Aluminum Oxide Powder for Industrial Use and Manufacturing373byte

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3D Printing 15-45μ M Chromium Nanoparticles1946byte

Molybdenum Target for Vacuum Sputtering Coating1797byte

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Custom Size Rare Earth Sputtering Target Lanthanum Target2138byte

Lork Custom Purity Tantalum Materials 5n5 Disc for Semiconductor Sputtering Target Pure Tantalum Cake4387byte

High Quality 98% Purity Vanadium Dioxide CAS 12036-21-41878byte

Boron Powder Standard Laboratory Coating Consumables16223byte

Low Price and High-Quality Nickel Powder 99.99% Metal Powder1702byte

High Purity Magnetron Sputtering Nickel Target1403byte

Oxygen Free Copper Vacuum Coating Target Ofhc Copper Tube Target2761byte

Chromium Granule for Vacuum Coating3509byte

99.9% Pure Tial Titanium Aluminum Alloy Sputtering Target for Decoration Coating6802byte

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Xinkang Customized 99.99% High Purity Aluminum Sputtering Target for Vacuum Coating3993byte

OEM Cutstomize Size Special-Shaped Sputtering Target Metal Target1815byte

Lork Custom Csf Alloy Precious Metal Round Cake 99.99% Purity Csf Gold Sputtering Target Disc2607byte

Polished Molybdenum Sputtering Target (99.95% pure)1247byte

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99.99% Cr3c2 Targets Chromium Carbide Ceramic Sputtering Targets6010byte

High Quality Molybdenum Copper Bonding X Ray Medical Device Part Rotors7851byte

High Purity 99.999% Tungsten W Target Tungsten Metal Sputtering Target for Coating2870byte

SeAsGeSi Target Selenium As Germanium Silicon Ceramic Sputtering Target for Optical Thin Film Coating3219byte

Durable Optical Coating Rare Earth Yttrium Sputtering Metal Target2232byte

Metal Sputtering Target Tin Stannum Sn Inexpensive Price1652byte

PVD Target 3n Fe2o3 Disc Iron Trioxide Sputtering Target with Copper Backing Plate1636byte

High Purity of Zirconium Tube Sputtering Target Zirconium Pipe Zirconium Magnetron Vacuum Coating Target1992byte

High Purity Silicon Nitride Target Material1402byte

99.95% Purity Chromium Pellets with 1~3mm Irregular Shape3509byte

3n5, 4n Alsi Aluminum Silicon Alloy Sputtering Target for Semiconductor Use6739byte

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X Ray Tube Consumables-Stationary (fixed) Anode10088byte

Cr Rod Sputtering Target for Decoration Film Coating3279byte

High Purity 99.995% Indium in Sputtering Target1652byte

High Quality Yttrium Oxide Y2o3 Sputtering Target Coating Material2232byte

Customized Size Znal95/5wt% Zinc Aluminum Alloy Sputter Target for Coating4535byte

High Purity 99.9% 60nm, 99.6% 600nm Chromium Nanoparticles1958byte

Tantalum Target, Tantalum Plate, Magnetron Sputtering Coating Machine Consumables16745byte

99.9% High-Purity High-Quality Copper Powder Suitable for Conductive Ink1871byte

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Titanium Aluminum/Tial / Cr/Zr/Ti Target for PVD Coating Machine/Plant/Equipment/System919byte

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