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CIPDBChina IndustryMetallurgy, Mineral & EnergyTarget Material



Metal Copper T2 Red Cu Sputtering Target Copper Planar Round Target1

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Target MaterialCopper Planar TargetCopper Round Target

Changsha Xinkang Advanced Materials Co., Ltd.

Preview:

Product Description Product Description XinKang Factory Supply Top Ranking 3N-5N 99.999% High Purity Cuprum/Cu/Copper Tube Target Pipe Target Rotatable Target for PVD CoatingNameMetal Copper Pipe Target (Cu Target)MaterialCopper Metal MaterialsPurity99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N,SizeD50.8x3mm, 2inch,3inch,Or As RequestColorMetallic ColorShapePlanar/Round/Plate/Rotary/Bar/Tube , As Request.SurfacePolished SurfaceDensity8.954g/cm3Melting Point1083°CApplicationPVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etcRelated ItemAl,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targetsNoteSupport customize size,shape,purity,different alloy proportion etc.Contact us firstly (Price is based on size and purity)Description:Copper sputtering target has the same properties as metal copper(Cu).Copper is a chemical element with the symbol Cu (from Latin: cuprum) and atomic number 29. It is a soft, malleable, and ductile metal with very high thermal and electrical conductivity. A freshly exposed pure copper is pinkish-orange. Copper is used as a conductor of heat and electricity, as a building material, and as a constituent of various metal alloys.Copper Sputtering Target is produced by melting technology, it's widely applied for semiconductor, decorative coating and advanced packing field.We can produce copper sputtering target with purity of 99.9%~99.9999%, and the lowest oxygen content can be <1ppm, it is mainly used for display screen and touch screen wiring and protective film, solar light absorbing layer, semiconductor wiring, etc. We not only produce planar copper sputtering targets (maximum G8.5 generation), but also copper rotary targets, which are mainly used for the touch screen industry. Since it is difficult to break the grain, we can only process with very large deformation and control the growth of twins to achieve a fine and uniform microstructure, which ensure a lower erosion rate and sensitivity of the formation of particles during sputtering.Product Parameters Application: Preparation process of copper sputtering targetMaterial preparation-electrolytic purification & electron beam melting-chemical analysis-forging-rolling-annealing-metallographic inspection-machining-dimensional inspection-cleaning-final inspection-packagingCopper sputtering target and preparation method thereofThe copper is purified from 99.95% to 99.99%, 99.999%, and 99.9999% through multiple electrolysis and regional smelting. The highest purity in China is about 99.9999% (6N). With high-purity copper ingots as raw materials, forging, rolling, and heat treatment of the raw materials can make the crystal grains in the copper ingots become smaller and increase the density to meet the requirements of copper targets for sputtering. The high-purity copper material after the deformation treatment is mechanically processed. The copper target processing requires high precision and high surface quality, and it can be processed into the target size required by the vacuum coating machine.Other alloy forms of copper sputtering targetTin-copper, arsenic-copper, tungsten-copper, silver-copper, copper-phosphorus, nickel-copper alloy targets, etc.Related Products:Company Profile Factory:Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd is a professional factory specialized in the research, development, production, processing, sales and service of metal materials.Including: Metal elements, Alloy,metal sputtering targets, alloy targets,ceramic targets,evaporation materials, Metal powder,alloy powder,and other customized metal items. We process our products according to the standards of GB/T, ASTM/B ASME SB, AMS, DIN, JIS and other requirements from customers. And these products have been widely used in the petrochemical industry, aerospace and aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery and instruments, metallurgy, automotive and other fields. Our factory is located in Changsha, Hunan, which covers an area of 4000 square meters. It has been certificated with ISO9001:2015 quality management system and ISO14001:2015 environmental management system. At present, the company is well equipped with Hi-tech equipment and a huge contingent of technicians. To ensure the excellent quality, we test the products with carbon sulfur instrument, spectrometer, flaw detector, cupping machine, stiffness tester and so on. Professional technician, skilled workers and advanced equipment enable us to present products and services with high quality. Our products have been exported to USA, Europe, Middle East, Japan, Korea, Singapore, India and Kenya, it's good quality, competitive price, timely delivery and best after-sales service are highly appreciated by our customers.Certifications Factory and Equippments Packaging & Shipping  FAQ 1.Are you trading company or manufacturer? Xinkang:We are a professional manufacturer specialized in this field for over 10 years. 2.How long is your delivery time? XinKang:Shipment can be made in 3-5days for those regular size,or samples, and 15 days for batch quantity. 3.Do you have MOQ?XinKang:No,We support samples. 4.What is your payment method? XinKang:T/T in advance, Paypal, Western Union and etc.  Welcome to contact us at any time! 

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Target Material: Metal Copper T2 Red Cu Sputtering Target Copper Planar Round Target
Pure 5n Cu Copper Cathode Sputtering Target2429byte
99.95% Moly Tube Target Sputtering Molybdenum Target1604byte
Lork Custom ASTM B393 Purity Niobium Materials 5n5 Disc for Semiconductor Sputtering Target Pure Niobium Cake4068byte
99.9% 50nm, 99.8% 800nm Stannum/Tin Nanoparticles2628byte
Molybdenum Disc Target for Vacuum Sputtering Coating1807byte

Laboratory Equipment Coating Consumables Nano Iridium Powder, Nano Tungsten Powder, Nano Nickel Powder16648byte
99.9% Low-Cost High-Purity Cobalt Powder1524byte
High-Quality Rotary Zirconium Sputtering Target Zirconium Tube Target1992byte
99.99% High Purity Gold Tin Alloy Sputtering Target1402byte
Chromium Metal Particle Chromium Granule3509byte

Metal Tizr Alloy Sputter Titanium Zirconium Sputtering Target for Coating5854byte
Silicon Carbide Sic High Purity Coated Ceramic Target Magnetron Sputtering Processing Customization2136byte
Te Target Tellurium Sputtering Target for Solar Photovoltaics3245byte
High Quality Germanium Ge Sputtering Target for Vacuum PVD Coating1654byte
Anode Copper Caps, Rotating Anode Targets for X Ray Tube Insert Parts6717byte

Znse Sputtering Target for PVD Coating1119byte
Black Round Yb High-Purity Sputtering Metal Target for Flat Panel Display2476byte
Ti Sputtering Titanium Target/Titanium Sputter Target/Vacuum Coating Titanium Target2158byte
99.99% Chromium Sputtering Target Chromium Coating Chromium Target1361byte
Lork Custom High Purity Nickel Alloy 4n5 Round Cake for Semiconductor Sputtering Target Disc3650byte

Versatile Nano Aluminum Oxide Powder for Industrial Use and Manufacturing373byte
Laboratory Equipment Coating Consumables Nano Aluminum Oxide Powder16749byte
3D Printing 15-45μ M Chromium Nanoparticles1946byte
Molybdenum Target for Vacuum Sputtering Coating1797byte
Best Price Nano Nickel Powder1524byte

Customized Tungsten Product Sputtering Pure Tungsten Target1501byte
Sputtering Target1697byte
Aluminum Titanium Alloy Cathode Magnetron Sputtering Target Alti Alloy Target919byte
Nickel Target 99.99 High Purity Sputtering Plane Target1403byte
99.95% 1-3mm Chromium Cr Granules for Vacuum Coating3509byte

99.99% Pure Zinc Oxide Sputtering Target ZnO Target for Magnetron Coating1177byte
Custom Size Rare Earth Sputtering Target Lanthanum Target2138byte
Lork Custom Purity Tantalum Materials 5n5 Disc for Semiconductor Sputtering Target Pure Tantalum Cake4387byte
High Quality 98% Purity Vanadium Dioxide CAS 12036-21-41878byte
Boron Powder Standard Laboratory Coating Consumables16223byte

Low Price and High-Quality Nickel Powder 99.99% Metal Powder1702byte
High Purity Magnetron Sputtering Nickel Target1403byte
Oxygen Free Copper Vacuum Coating Target Ofhc Copper Tube Target2761byte
Chromium Granule for Vacuum Coating3509byte
99.9% Pure Tial Titanium Aluminum Alloy Sputtering Target for Decoration Coating6802byte

99.99% Tungsten Titanium Sputtering Target, Wti10 Square Sputtering Target Manufacturer2915byte
Molybdenum Anode Target for X Ray Tube6717byte
Metal Sputtering Target Germanium Ge Inexpensive Price1654byte
V2O5 Target Vanadium Oxide Ceramic Target For LCD3198byte
Xinkang Customized 99.99% High Purity Aluminum Sputtering Target for Vacuum Coating3993byte

OEM Cutstomize Size Special-Shaped Sputtering Target Metal Target1815byte
Lork Custom Csf Alloy Precious Metal Round Cake 99.99% Purity Csf Gold Sputtering Target Disc2607byte
Polished Molybdenum Sputtering Target (99.95% pure)1247byte
High Purity Tin 15/45/75 μ M Stannum Nanopowder at Best Price2626byte
Standard Laboratory Coating Consumables Magnetron Sputtering Coating Targets16734byte

High Purity Crystalline Tungsten Powder Is Suitable for Thermal Spraying Industry3076byte
High Quality Titanium Cathode Magnetron Sputtering Coating Target919byte
High Purity Chromium Target for Vacuum/PVD Coating1403byte
Optical Vacuum Coating Material Silicon Si Granule3492byte
99.99% High Purity Cofe Cobalt Iron Alloy Sputtering Target for Thin Film Coating6828byte

2-4inch 99.95% Rhodium Target Manufacture1687byte
Professional Manufacturer for Rotary Anode Sputtering Target, Molybdenum Rhenium Tungsten Composite Rotating Anode Target6717byte
Mn Target Manganese Sputtering Target for Optical Thin Film Coating/PVD Film Coating3209byte
Manufacture Value Price Titanium Ti Sputtering Target China1654byte
Custom Size Rare Earth Special-Shaped Sputtering Metal Target for Solar Cell1815byte

Arc Cathode Zirconium Target for Precision Magnetron Sputtering Applications1992byte
Silicon Granule for Used as a Semiconductor Material3492byte
99.99% Cr3c2 Targets Chromium Carbide Ceramic Sputtering Targets6010byte
High Quality Molybdenum Copper Bonding X Ray Medical Device Part Rotors7851byte
High Purity 99.999% Tungsten W Target Tungsten Metal Sputtering Target for Coating2870byte

SeAsGeSi Target Selenium As Germanium Silicon Ceramic Sputtering Target for Optical Thin Film Coating3219byte
Durable Optical Coating Rare Earth Yttrium Sputtering Metal Target2232byte
Metal Sputtering Target Tin Stannum Sn Inexpensive Price1652byte
PVD Target 3n Fe2o3 Disc Iron Trioxide Sputtering Target with Copper Backing Plate1636byte
High Purity of Zirconium Tube Sputtering Target Zirconium Pipe Zirconium Magnetron Vacuum Coating Target1992byte

High Purity Silicon Nitride Target Material1402byte
99.95% Purity Chromium Pellets with 1~3mm Irregular Shape3509byte
3n5, 4n Alsi Aluminum Silicon Alloy Sputtering Target for Semiconductor Use6739byte
99.95% Wholesale China Pure Nb Metal Sputtering Target Niobium Sheet1761byte
X Ray Tube Consumables-Stationary (fixed) Anode10088byte

Cr Rod Sputtering Target for Decoration Film Coating3279byte
High Purity 99.995% Indium in Sputtering Target1652byte
High Quality Yttrium Oxide Y2o3 Sputtering Target Coating Material2232byte
Customized Size Znal95/5wt% Zinc Aluminum Alloy Sputter Target for Coating4535byte
High Purity 99.9% 60nm, 99.6% 600nm Chromium Nanoparticles1958byte

Tantalum Target, Tantalum Plate, Magnetron Sputtering Coating Machine Consumables16745byte
99.9% High-Purity High-Quality Copper Powder Suitable for Conductive Ink1871byte
Copper Target PVD Vacuum Sputtering Target1402byte
Titanium Aluminum/Tial / Cr/Zr/Ti Target for PVD Coating Machine/Plant/Equipment/System919byte
High Quality 1-3mm High Purity 99.95% Cr Chromium Granule for Coating3509byte






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