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High Purity Zn Metal Zinc Plate Sputtering Target for PVD Machine¹

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Product Description Thin film coating materials zinc/Zn sputtering target Zinc Sputtering Target is produced by melting technology, normally used for depositing Znic oxide thin film, which can be luminescent film of LED and OLED products, or transparent conducting film of OLED products and anti-reflection film of thin-film solar cells. With up to 4N purity and special annealing treatment, uniform grain size, lower gas content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process. Product: zinc/Zn sputtering targetPurity: 99.99%Size: customizedShape: Planar and rotaryPacking: Vacumm sealed, wooden case

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Target Material: High Purity Zn Metal Zinc Plate Sputtering Target for PVD Machine

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