Send

Food Packaging Bag

Gift Box & Bag

Industrial Packaging Bag

Logistics Packaging

Machinery for Packaging Supplies

Non Woven Bag

Other Bags & Cases

Package & Conveyance

Package & Printing Service

Packaging Bags

Packaging Materials

Packing Bottle

Packing Machinery

Post-Press Equipment

Pre-Press Equipment

Printing Machinery

Printing Materials

Shopping Bags

Specialized Case & Box

Stencil

Tag & Sign

Tag Gun

Tool Packaging

Watch Box

CIPDBChina IndustryMetallurgy, Mineral & EnergyTarget Material



High Pure Molybdenum Sheet Plate Sputtering Target1

« Previous Next »

Target MaterialMolybdenum PlateMolybdenum Sheet Plate Sputtering Target

Changsha Xinkang Advanced Materials Co., Ltd.

Preview:

Product Description Product DescriptionAvailable purity: 99.95%Dimension: according to your requestAvailable shape: circular, rectangularDensity: 10.28g/cm3Melting point: 2617Production method: Powder matallurgyCertificate of analysis is availableSpecificationitemvaluePlace of OriginChina HunanBrand NameXinkangApplicationPVD coatingShaperectangular, circularMaterialMolybdenumChemical Composition99.95%Avaliable purity3N5SizecustomizedCertificateCOA, MSDS,ISO9001Brand NameXinkangShaperectangular, circularMaterialMolybdenumChemical Composition99.95%ApplicationPVD coatingProduct nameHigh pure Molybdenum sheet plate sputtering targetKeywordsMolybdenum sheet plate sputtering target Company Profile Xinkang Coating Materials Business Division was established in February 2015, it is an important part of Changsha Xinkang functional materials solution section,Relying on the rich product development experience of Changsha Xinkang in the field of new materials, we are committed to the development of high purity materials as the core of the high-end coating material technology solutions, our products mainly include sputtering coating materials and evaporation coating materials. Sputtering coating material--Vacuum sputtering coating process has good repeatability and the film thickness are controllable, the thin film with uniform thickness can be obtained on large area substrate materials, which has the advantages of high purity and good compactness, and has become one of the key technologies of preparing thin films, the metal and ceramic sputtering target used for sputtering coating has also become the largest amount of coating materials in the current market, which be widely used in semiconductor, solar photovoltaic, flat panel display and electric new energy applications. Evaporation coating material--Vacuum evaporation coating technology is simple and convenient, easy to operate, fast film forming speed and other characteristics, which is widely used coating technology. Vacuum coating materials can be divided into metal, alloy pellets according to the chemical composition of evaporation materials, oxygen compound vaporizer, fluoride vaporizer, sulfide vaporizer, etc., widely used in optical components, LED, flat panel display and semi-conductor industry.CertificationsExhibitionPacking & DeliveryStandard export packaging: Vacuum sealed package inside; export carton or wooden case outsideShipment can be made by Fedex, DHL, UPS, TNT express etc. for gross weight ≤100KG;For large shipment ≥100KG , shipping method will be discussed with you.FAQ1. who are we?We are based in Hunan, China, start from 2014,sell to Domestic Market(40.00%),North America(15.00%),Western Europe(11.00%),Eastern Asia(11.00%),Eastern Europe(11.00%),South America(4.00%),Mid East(4.00%),Southeast Asia(4.00%). There are total about 51-100 people in our office.2. how can we guarantee quality?Always a pre-production sample before mass production;Always final Inspection before shipment;3.what can you buy from us?Sputtering Target, Evaporation Materials, Machining Parts, Metal Cubes, Coating Accessory4. why should you buy from us not from other suppliers?With full production, machining and inspection equipment, professional materials engineers, ISO9001 certificated, we are specialized in producing various metal and metal alloy materials, no matter for mass production or R&D.5. what services can we provide?Accepted Delivery Terms: FOB,CIF,EXW,DDU,Express DeliveryAccepted Payment Currency:USD,CNY;Accepted Payment Type: T/T,PayPal,Western Union;Language Spoken:English,Chinese

Link supplier or manufacturer »

Target Material: High Pure Molybdenum Sheet Plate Sputtering Target
Pure 5n Cu Copper Cathode Sputtering Target2429byte
99.95% Moly Tube Target Sputtering Molybdenum Target1604byte
Lork Custom ASTM B393 Purity Niobium Materials 5n5 Disc for Semiconductor Sputtering Target Pure Niobium Cake4068byte
99.9% 50nm, 99.8% 800nm Stannum/Tin Nanoparticles2628byte
Molybdenum Disc Target for Vacuum Sputtering Coating1807byte

Laboratory Equipment Coating Consumables Nano Iridium Powder, Nano Tungsten Powder, Nano Nickel Powder16648byte
99.9% Low-Cost High-Purity Cobalt Powder1524byte
High-Quality Rotary Zirconium Sputtering Target Zirconium Tube Target1992byte
99.99% High Purity Gold Tin Alloy Sputtering Target1402byte
Chromium Metal Particle Chromium Granule3509byte

Metal Tizr Alloy Sputter Titanium Zirconium Sputtering Target for Coating5854byte
Silicon Carbide Sic High Purity Coated Ceramic Target Magnetron Sputtering Processing Customization2136byte
Te Target Tellurium Sputtering Target for Solar Photovoltaics3245byte
High Quality Germanium Ge Sputtering Target for Vacuum PVD Coating1654byte
Anode Copper Caps, Rotating Anode Targets for X Ray Tube Insert Parts6717byte

Znse Sputtering Target for PVD Coating1119byte
Black Round Yb High-Purity Sputtering Metal Target for Flat Panel Display2476byte
Ti Sputtering Titanium Target/Titanium Sputter Target/Vacuum Coating Titanium Target2158byte
99.99% Chromium Sputtering Target Chromium Coating Chromium Target1361byte
Lork Custom High Purity Nickel Alloy 4n5 Round Cake for Semiconductor Sputtering Target Disc3650byte

Versatile Nano Aluminum Oxide Powder for Industrial Use and Manufacturing373byte
Laboratory Equipment Coating Consumables Nano Aluminum Oxide Powder16749byte
3D Printing 15-45μ M Chromium Nanoparticles1946byte
Molybdenum Target for Vacuum Sputtering Coating1797byte
Best Price Nano Nickel Powder1524byte

Customized Tungsten Product Sputtering Pure Tungsten Target1501byte
Sputtering Target1697byte
Aluminum Titanium Alloy Cathode Magnetron Sputtering Target Alti Alloy Target919byte
Nickel Target 99.99 High Purity Sputtering Plane Target1403byte
99.95% 1-3mm Chromium Cr Granules for Vacuum Coating3509byte

99.99% Pure Zinc Oxide Sputtering Target ZnO Target for Magnetron Coating1177byte
Custom Size Rare Earth Sputtering Target Lanthanum Target2138byte
Lork Custom Purity Tantalum Materials 5n5 Disc for Semiconductor Sputtering Target Pure Tantalum Cake4387byte
High Quality 98% Purity Vanadium Dioxide CAS 12036-21-41878byte
Boron Powder Standard Laboratory Coating Consumables16223byte

Low Price and High-Quality Nickel Powder 99.99% Metal Powder1702byte
High Purity Magnetron Sputtering Nickel Target1403byte
Oxygen Free Copper Vacuum Coating Target Ofhc Copper Tube Target2761byte
Chromium Granule for Vacuum Coating3509byte
99.9% Pure Tial Titanium Aluminum Alloy Sputtering Target for Decoration Coating6802byte

99.99% Tungsten Titanium Sputtering Target, Wti10 Square Sputtering Target Manufacturer2915byte
Molybdenum Anode Target for X Ray Tube6717byte
Metal Sputtering Target Germanium Ge Inexpensive Price1654byte
V2O5 Target Vanadium Oxide Ceramic Target For LCD3198byte
Xinkang Customized 99.99% High Purity Aluminum Sputtering Target for Vacuum Coating3993byte

OEM Cutstomize Size Special-Shaped Sputtering Target Metal Target1815byte
Lork Custom Csf Alloy Precious Metal Round Cake 99.99% Purity Csf Gold Sputtering Target Disc2607byte
Polished Molybdenum Sputtering Target (99.95% pure)1247byte
High Purity Tin 15/45/75 μ M Stannum Nanopowder at Best Price2626byte
Standard Laboratory Coating Consumables Magnetron Sputtering Coating Targets16734byte

High Purity Crystalline Tungsten Powder Is Suitable for Thermal Spraying Industry3076byte
High Quality Titanium Cathode Magnetron Sputtering Coating Target919byte
High Purity Chromium Target for Vacuum/PVD Coating1403byte
Optical Vacuum Coating Material Silicon Si Granule3492byte
99.99% High Purity Cofe Cobalt Iron Alloy Sputtering Target for Thin Film Coating6828byte

2-4inch 99.95% Rhodium Target Manufacture1687byte
Professional Manufacturer for Rotary Anode Sputtering Target, Molybdenum Rhenium Tungsten Composite Rotating Anode Target6717byte
Mn Target Manganese Sputtering Target for Optical Thin Film Coating/PVD Film Coating3209byte
Manufacture Value Price Titanium Ti Sputtering Target China1654byte
Custom Size Rare Earth Special-Shaped Sputtering Metal Target for Solar Cell1815byte

Arc Cathode Zirconium Target for Precision Magnetron Sputtering Applications1992byte
Silicon Granule for Used as a Semiconductor Material3492byte
99.99% Cr3c2 Targets Chromium Carbide Ceramic Sputtering Targets6010byte
High Quality Molybdenum Copper Bonding X Ray Medical Device Part Rotors7851byte
High Purity 99.999% Tungsten W Target Tungsten Metal Sputtering Target for Coating2870byte

SeAsGeSi Target Selenium As Germanium Silicon Ceramic Sputtering Target for Optical Thin Film Coating3219byte
Durable Optical Coating Rare Earth Yttrium Sputtering Metal Target2232byte
Metal Sputtering Target Tin Stannum Sn Inexpensive Price1652byte
PVD Target 3n Fe2o3 Disc Iron Trioxide Sputtering Target with Copper Backing Plate1636byte
High Purity of Zirconium Tube Sputtering Target Zirconium Pipe Zirconium Magnetron Vacuum Coating Target1992byte

High Purity Silicon Nitride Target Material1402byte
99.95% Purity Chromium Pellets with 1~3mm Irregular Shape3509byte
3n5, 4n Alsi Aluminum Silicon Alloy Sputtering Target for Semiconductor Use6739byte
99.95% Wholesale China Pure Nb Metal Sputtering Target Niobium Sheet1761byte
X Ray Tube Consumables-Stationary (fixed) Anode10088byte

Cr Rod Sputtering Target for Decoration Film Coating3279byte
High Purity 99.995% Indium in Sputtering Target1652byte
High Quality Yttrium Oxide Y2o3 Sputtering Target Coating Material2232byte
Customized Size Znal95/5wt% Zinc Aluminum Alloy Sputter Target for Coating4535byte
High Purity 99.9% 60nm, 99.6% 600nm Chromium Nanoparticles1958byte

Tantalum Target, Tantalum Plate, Magnetron Sputtering Coating Machine Consumables16745byte
99.9% High-Purity High-Quality Copper Powder Suitable for Conductive Ink1871byte
Copper Target PVD Vacuum Sputtering Target1402byte
Titanium Aluminum/Tial / Cr/Zr/Ti Target for PVD Coating Machine/Plant/Equipment/System919byte
High Quality 1-3mm High Purity 99.95% Cr Chromium Granule for Coating3509byte






Purchasing Agent


Note: Send your message to supplier or manufacturer.

Welcome to our Professional and comprehensive procurement services...

Message:


Post Sourcing Request Now »

  • Professiona Secured Trading Service
  • Verified Business Licenses to Supplier or Manufacturer
  • Welcome to our Global alliance Member