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Blackened Molybdenum Rhenium Tungsten Rotating Anode Target Sputtering Target for X Ray Tube Insert Parts⁸

351.High Purity Copper Oxide Sputtering Target for Semiconductor Target Material Sputtering Target Copper Oxide Sputtering Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3149 byte

352.Aluminum Cone 3n-5n Metal Aluminum Sputtering Target for Vacuum Coating Target Material Aluminum Arc Sputtering Target Aluminum Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	4769 byte

353.Sputter/Sputtering Target Mono Crystal Silicon for Sputtering Machine Target Material Silicon Sputtering Target Si Sputter Target Changsha Xinkang Advanced Materials Co., Ltd.	1475 byte

354.99.999% Sputter/Sputtering Target Poly Crystal Silicon for Sputtering Machine Target Material Silicon Sputtering Target Si Sputter Target Changsha Xinkang Advanced Materials Co., Ltd.	1475 byte

355.High Purity 99.95% Hafnium Hf Magnetron Sputtering Target for Advanced Coatings Target Material Hafnium Sputtering Target Hf Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	272 byte

356.Si3N4 Sputtering Ceramic Target for Film Coating Target Material Sputtering Target Si3N4 Sputtering Ceramic Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3234 byte

357.High Purity 99.99% ITO Indium Tin Oxide Sputtering Target for PVD Coating Target Material Indium Tin Oxide Sputtering Target ITO Sputtering Target Lonwin Industry Group Limited	6827 byte

358.99.95% Znsn Metal Alloy Magnetron Zinc Tin Sputtering Target Target Material Zinc Tin Sputtering Target Znsn Sputtering Target Lonwin Industry Group Limited	5661 byte

359.Xinkang Molybdenum Sputtering Target 99.95% Metal Molybdeum Disc for Vauum Coating Evaporation Material Molybdneum Target High Purit Molybdneum Spittering Target Changsha Xinkang Advanced Materials Co., Ltd.	3152 byte

360.99.99% Pure Li2mno3 Sputtering Target Li2mno3 Target for PVD Sputtering Target Material Li2mno3 PVD Target Li2mno3 Target Sputtering Changsha Xinkang Advanced Materials Co., Ltd.	1277 byte

361.99.99% Pure Bifeo3 Sputtering Target Bifeo3 Target for Sputtering Target Material Bifeo3 PVD Target Bifeo3 Target Sputtering Changsha Xinkang Advanced Materials Co., Ltd.	1266 byte

362.High Purity Aluminum Target Vacuum Magnetron Sputtering Target Target Material Aluminium Target Target Material Dongguan Gravel Industries and Enterprise Company Limited	1402 byte

363.GeSe Target Germanium Selenium Alloy Target for Memory Chips/Integrated Circuits Target Material Sputtering Target GeSe Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3275 byte

364.Ruthenium Square Target, Ru Splice Target Target Material Ru Splice Target Ru Sputtering Target Metal Target Rheniumet Ltd.	2631 byte

365.Xinkang 5n 99.999% High Purity Cuprum/Cu/Copper Tube Target for PVD Coating Target Material Copper Tube Target Copper Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	5451 byte

366.Anode (X-ray tube) or Stationary Anode Target Material Stationary Anode Copper Tungsten Anode Zhuzhou Weilai New Materials Technology Co., Ltd.	10088 byte

367.NiCr Alloy Target Chromium Nickel Alloy Sputtering Target for LCD/Integrated Circuits Target Material Sputtering Target Chromium Nickel Alloy Sputtering Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3322 byte

368.3n, 3n5, 4n Iron Ferrum Sputtering Target Fe Round Target for PVD Coating Target Material 3n5 4n Iron Ferrum Sputtering Target Fe Round Target for PVD Coating Iron Sputtering Target Iron Sputter Target Lonwin Industry Group Limited	6462 byte

369.99.99% Ti Titanium Sputtering Target Titanium Cathode for Coating Target Material Titanium Sputtering Target Ti Sputtering Target Lonwin Industry Group Limited	6526 byte

370.ZnTe Target Zinc Telluride Ceramic Target for Semiconductor Target Material Sputtering Target ZnTe Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3146 byte

371.Nb2O5 Target Nb2Ox Niobium Oxide Ceramic Target for Optical Thin Film Coating/Semiconductor Target Material Sputtering Target Nb2O5 Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3251 byte

372.Mono-Si Target Monocrystalline Silicon Ceramic Granules Target for Sputtering Target/Mobile Phone Target Material Sputtering Target Monocrystalline Silicon Ceramic Granules Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3352 byte

373.Ceramic Targets MOS2 Sputtering Target Molybdenum Disulfide Sputtering Targets for Coating Evaporation Material MOS2 Targets Molybdenum Disulfide Target Changsha Xinkang Advanced Materials Co., Ltd.	3923 byte

374.High-Quality Rotary Zirconium Sputtering Target Zirconium Tube Target Target Material Zirconium Plate Zirconium Target Zhongzheng Yejin Technology Co., Ltd.	1992 byte

375.High Purity Tungsten-Nickel-Chromium/Tungsten-Nickel/Nickel-Chromium Sputtering Target for Thin Film Industry Target Material Tungsten-Nickel Target Nickel Chromium Target Rheniumet Ltd.	1233 byte

376.Custom Size Rare Earth Special-Shaped Sputtering Metal Target for Solar Cell Target Material Special-Shaped Target Rare Earth Metal Target Inner Mongolia Rongtai Rhenium New Materials Co., Ltd.	1815 byte

377.High Purity 99.95% Iridium IR Sputtering Target Custom 1-3mm Thick Target Material IR Sputtering Target Iridium Metal Target Rheniumet Ltd.	1488 byte

378.ITO Sputtering Target with Customized Size Target Material ITO Ceramic Sputtering Target Customized ITO Target Changsha Xinkang Advanced Materials Co., Ltd.	3786 byte

379.PVD Target 5n 6n Aluminum Sputtering Target Aluminum Plate for Magnetron Coating Target Material Aluminium Sputtering Target High Purity Aluminum Changsha Xinkang Advanced Materials Co., Ltd.	1473 byte

380.High Purity 4n 99.99% Titanium Sputtering Target Metal Titanium Rectangle Targets Plate Target Material Titanium Sputtering Target Ti Target Changsha Xinkang Advanced Materials Co., Ltd.	3922 byte

381.99.99% Pure Round Rectangular Titanium Dioxide Conductive TiO2 Sputtering Target Target Material TiO2 Target TiO2 Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	389 byte

382.Tungsten Nickel Chromium Sputtering Target Target Material Tungsten Nickel Chromium Target Sputtering Target Rheniumet Ltd.	1178 byte

383.99.9% Cugd Alloy Target Copper Gadolinium Sputtering Target Target Material Copper Gadolinium Sputtering Target Cugd Sputtering Target Lonwin Industry Group Limited	5246 byte

384.Cu Copper Sputtering Target Metal Copper Rotary Target for Magnetron Sputtering Target Material Copper Sputtering Target Copper Magnetron Target Lonwin Industry Group Limited	6491 byte

385.99.99% Ysz Ceramic Target Yttria Stabilized Zirconia Sputtering Target Target Material Yttria Stabilized Zirconia Sputtering Target Ysz Sputtering Target Lonwin Industry Group Limited	6550 byte

386.Alnd Alloy Target Aluminum Neodymium Sputtering Target Target Material Aluminum Neodymium Sputtering Target Alnd Sputtering Target Lonwin Industry Group Limited	5375 byte

387.99.95% Izo Ceramic Target Indium Zinc Oxide Sputtering Target Target Material Indium Zinc Oxide Sputtering Target Izo Sputtering Target Lonwin Industry Group Limited	5914 byte

388.99.99% Tasi2 Ceramic Target Tantalum Silicide Sputtering Target Target Material Tantalum Silicide Sputtering Target Tasi2 Sputtering Target Lonwin Industry Group Limited	5532 byte

389.GeTeSnIn Target Getesbin Germanium Antimony Telluride Indium Alloy Target for Memory Chips/Integrated Circuits Target Material Sputtering Target GeTeSnIn Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3283 byte

390.SnO2 Target Tin Oxide Ceramic Target for Semiconductor Target Material Sputtering Target SnO2 Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3177 byte

391.High Purity Zinc-Aluminium Oxide Sputtering Target for Optical Coating Applications Target Material Zinc-Aluminium Oxide Sputtering Target Azo Ceramic Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	3911 byte

392.High Density CEO2 Target Cerium Oxide Sputtering Target for Magnetron Coating Target Material CEO2 Sputtering Target High Density Target Changsha Xinkang Advanced Materials Co., Ltd.	994 byte

393.High Purity of Zirconium Tube Sputtering Target Zirconium Pipe Zirconium Magnetron Vacuum Coating Target Target Material Zirconium Plate Zirconium Target Zhongzheng Yejin Technology Co., Ltd.	1992 byte

394.99.99% -99.9999% Titanium Ti Sputtering Plate Titanium Target for Vacuum Coating Target Material 99.999% High Purity Titanium Sputtering Target Titanium Sputtering Target Rheniumet Ltd.	1552 byte

395.Customized Size Ceramic Sputtering Target Target Material Ceramic Sputtering Target Custom Size Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	3845 byte

396.High Pure 99.99% Alumina/Al2O3 Ceramic Sputtering Targets Target Material Alumina Sputtering Target Aluminium Oxide Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	286 byte

397.AlCu Alloy Target Aluminium Copper Alloy Sputtering Target for Semiconductor Target Material Sputtering Target AlCu Alloy Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3270 byte

398.CuNi Alloy Target Copper Nickl Alloy Sputtering Target for Semiconductor Target Material Sputtering Target CuNi Alloy Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3307 byte

399.Xinkang High Purity Al Aluminum Target Vacuum Magnetron Sputtering Target Target Material Aluminum Sputtering Target Aluminum Target Changsha Xinkang Advanced Materials Co., Ltd.	5676 byte

400.Circular Rare Earth Cerium Sputtering Target for Semiconductor Chip Target Material Rare Earth Metal Cerium Target Inner Mongolia Rongtai Rhenium New Materials Co., Ltd.	2235 byte

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