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MOS2 Ceramic Sputtering Target⁶

251.Customized Size Wti50wt% High Purity Sputtering Target for Thin Film Deposition Target Material Tungsten Titanium Alloy Target Wti50wt% Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	4706 byte

252.99.99% Purity Metal Iridium Target Customize Size IR Iridium Round Disc Sputtering Target Target Material Iridium Target Iridium Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	5862 byte

253.Customized Tair 80/20 Sputtering Target for High-Quality Thin Films Target Material Customized Target Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	4841 byte

254.Igh Purity Molybdenum Disilicide (MoSi2) Sputtering Target for Thin Film Coating Ceramic Material Molybdenum Disilicide Sputtering Target Mosi2 Target Material Changsha Xinkang Advanced Materials Co., Ltd.	6478 byte

255.High Purity 99.95% Cobalt Tantalum Zirconium Alloy Target for Sputtering Target Material Cotazr Sputtering Target Cobalt Tantalum Zirconium Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	367 byte

256.High Purity 99.99% Crsi Chromium Silicon Alloy Sputtering Target for Semiconductor Use Target Material Chromium Silicon Sputtering Target Crsi Sputtering Target Lonwin Industry Group Limited	6049 byte

257.99.95% Moly Tube Target Sputtering Molybdenum Target Target Material Molybdenum Target Sputtering Target Hubei Fotma Machinery Co., Ltd.	1604 byte

258.Special-Shaped Ruthenium Target Ruthenium Sputtering Target Customization Target Material Ru Sputtering Target Metal Target Rheniumet Ltd.	2655 byte

259.99.9% Cugd Alloy Target Copper Gadolinium Sputtering Target Target Material Copper Gadolinium Sputtering Target Cugd Sputtering Target Lonwin Industry Group Limited	5246 byte

260.Alnd Alloy Target Aluminum Neodymium Sputtering Target Target Material Aluminum Neodymium Sputtering Target Alnd Sputtering Target Lonwin Industry Group Limited	5375 byte

261.Cu Copper Sputtering Target Metal Copper Rotary Target for Magnetron Sputtering Target Material Copper Sputtering Target Copper Magnetron Target Lonwin Industry Group Limited	6491 byte

262.High Quality 99.95%Min OS Metal Target, Osmium Sputtering Target Customization Target Material Osmium Sputtering Target Customization OS Target Osmium Sputtering Target Rheniumet Ltd.	1052 byte

263.4n 99.99% High Purity Rhenium Metal Target, Re Round Sputtering Target Target Material Re Round Sputtering Target Rhenium Sputtering Target Rhenium Target Rheniumet Ltd.	1652 byte

264.Chromium Sputtering Target for Magnetron Sputtering Target Material Chromium Sputtering Target Chromium Target Changsha Xinkang Advanced Materials Co., Ltd.	877 byte

265.NiV Alloy Target Nickel Vanadium Alloy Sputtering Target for LCD/Semiconductor Target Material Sputtering Target NiV Alloy Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3320 byte

266.High-Quality 99.9% Magnesium Diboride Sputtering Target for Ceramic Coating Materials Target Material Magnesium Diboride Ceramic Target High-Purity Mgb2 Sputter Target Changsha Xinkang Advanced Materials Co., Ltd.	5007 byte

267.High Purity Vo2 Sputtering Target for Coating Advanced Applications Target Material Vo2 Sputtering Target Sputter Target Vo2 Changsha Xinkang Advanced Materials Co., Ltd.	1668 byte

268.Export 99.99% Ta2o5 Target Ta2o5 Sputtering Target for Thin Film Coating Target Material Ta2o5 Target Sputtering Ta2o5 Sputter Target Changsha Xinkang Advanced Materials Co., Ltd.	336 byte

269.Metal Tizr Alloy Sputter Titanium Zirconium Sputtering Target for Coating Target Material Titanium Zirconium Sputtering Target Titanium Zirconium Sputtering Target Lonwin Industry Group Limited	5854 byte

270.High Purity Manganese Target 99.9% Customized Size Ceramic Mn Manganese Sputtering Target Evaporation Material Manganese Sputtering Target High Purity Manganese Changsha Xinkang Advanced Materials Co., Ltd.	3515 byte

271.99.9% Znal Zinc Aluminum Alloy Sputtering Target for Vacuum Coating Target Material Zinc Aluminum Sputtering Target Znal Sputtering Target Lonwin Industry Group Limited	5349 byte

272.99.99% CrAl Chromium Aluminum Sputtering Target for Thin Film Deposition Target Material CrAl Sputtering Target Chromium Aluminum Sputtering Target Lonwin Industry Group Limited	5727 byte

273.Copper Chromium Zirconium Alloy Backing Plate Copper Sputtering Target Target Material Copper Alloy Sputtering Target 99.9% Copper Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	3102 byte

274.Osmium Rhenium Sputtering Target for Vacuum Sputtering Coating Target Material Osre25 Osre25 Sputtering Target Rheniumet Ltd.	1088 byte

275.PVD Target Znsn Zinc Tin Metal Alloy Magnetron Sputtering Target Target Material Zinc Tin Sputtering Target Zinc Tin Metal Alloy Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	1394 byte

276.High Performance Rotating Tungsten Sputtering Target Target Material Tungsten Target Sputtering Target Zhuzhou Weilai New Materials Technology Co., Ltd.	6717 byte

277.99.95% High Purity Pure Molybdenum Sputtering Target for Thin Film Industry Target Material Molybdenum Target Sputtering Target Rheniumet Ltd.	1257 byte

278.Tin Target 99.99% Metal Tin Sn Magnetron Sputtering Target for PVD Coating Evaporation Material Tin Target Metal Tin Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	3339 byte

279.Tin Target 99.99% Metal Tin Sn Magnetron Sputtering Target for PVD Coating Evaporation Material Tin Target Metal Tin Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	3339 byte

280.High Purity Tantalum Metal Sputtering Target for Thin Film Coating, Titanium/Rhodium /Ruthenium Sputtering Target Target Material Titanium/Rhodium /Ruthenium Sputtering Target Tantalum Target Tantalum Price Rheniumet Ltd.	2005 byte

281.Nicrsi Alloy Target Nickel Chromium Silicon Sputtering Target for PVD Coating Target Material Nickel Chromium Silicon Sputtering Target Nicrsi Sputtering Target Lonwin Industry Group Limited	6650 byte

282.OEM Cutstomize Size Special-Shaped Sputtering Target Metal Target Target Material Special-Shaped Target Sputtering Target Inner Mongolia Rongtai Rhenium New Materials Co., Ltd.	1815 byte

283.Ruthenium Target 99.99% Purity Metal Ruthenium Ru Round Disc Sputtering Target Target Material Ruthenium Target Ruthenium Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	5531 byte

284.Mn Target Manganese Sputtering Target for Optical Thin Film Coating/PVD Film Coating Target Material Sputtering Target Mn Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3209 byte

285.99.9% Ni Nickel Sputtering Target Metal Material Magnetron Ni Nickel Rotary Sputtering Targets Target Material Nickel Sputtering Target Nickel Metal Sputtering Target Lonwin Industry Group Limited	6437 byte

286.99.95% Pure Mo Molybdenum Sputtering Target for Coating Target Material Molybdenum Sputtering Target Molybdenum Sputtering Targets Lonwin Industry Group Limited	7022 byte

287.99.99% Pure Sio2 Ceramic Target for Thin Film Coating Ceramic Material 99.99% Sio2 Sputtering Target Ceramic Silicon Dioxide Materials Changsha Xinkang Advanced Materials Co., Ltd.	7490 byte

288.D50.8X3mm Niv7 Round Sputtering Target Target Material Niv7 Round Sputtering Target Nickel Vanadium Sputtering Targets Changsha Xinkang Advanced Materials Co., Ltd.	5539 byte

289.99.9% Sic Ceramic Target Silicon Carbide Silicon Carbon Sputtering Targets for Coating Target Material Silicon Carbon Sputtering Targets Sic Sputtering Targets Lonwin Industry Group Limited	6001 byte

290.High Purity Pure Aluminum Silicon Sputtering Target for Thin Film Industry Target Material Aluminum Silicon Sputtering Target Aluminum Silicon Alloy Sputtering Target Rheniumet Ltd.	1299 byte

291.99.99% Ceramic TiO2 Sputtering Target Black TiO2 Target for PVD Coating Target Material TiO2 Target TiO2 Disk Changsha Xinkang Advanced Materials Co., Ltd.	3871 byte

292.High Purity 99.999% Tungsten W Target Tungsten Metal Sputtering Target for Coating Target Material Tungsten Sputtering Target Wolfram Target Rheniumet Ltd.	2870 byte

293.3n, 3n5, 4n Iron Ferrum Sputtering Target Fe Round Target for PVD Coating Target Material 3n5 4n Iron Ferrum Sputtering Target Fe Round Target for PVD Coating Iron Sputtering Target Iron Sputter Target Lonwin Industry Group Limited	6462 byte

294.99.95% Pure Niobium Oxide Target Manufacturer Nb2o5 Sputtering Target Price Target Material Niobium Oxide Sputtering Target Niobium Oxide Sputtering Target Manufacturer Changsha Xinkang Advanced Materials Co., Ltd.	6316 byte

295.99.99% Nicu Nickel Copper Alloy Sputtering Target for PVD Coating Target Material Nickel Copper Sputtering Target Nicu Sputtering Target Lonwin Industry Group Limited	7004 byte

296.High Purity 99.95% Iridium IR Sputtering Target Custom 1-3mm Thick Target Material IR Sputtering Target Iridium Metal Target Rheniumet Ltd.	1488 byte

297.High Purity 4n 99.99% Titanium Sputtering Target Metal Titanium Rectangle Targets Plate Target Material Titanium Sputtering Target Ti Target Changsha Xinkang Advanced Materials Co., Ltd.	3922 byte

298.PVD Target 5n 6n Aluminum Sputtering Target Aluminum Plate for Magnetron Coating Target Material Aluminium Sputtering Target High Purity Aluminum Changsha Xinkang Advanced Materials Co., Ltd.	1473 byte

299.99.99% Pure Round Rectangular Titanium Dioxide Conductive TiO2 Sputtering Target Target Material TiO2 Target TiO2 Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	389 byte

300.AuSn Alloy Target Gold-Tin Alloy (70: 30wt%) Sputtering Target for Electronic Components Chips Target Material Sputtering Target AuSn Alloy Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3342 byte

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