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Titanium Sputtering Target Material⁹

401.Semiconductor Grade Tantalum Nitride Sputtering Target Tan Thin Film Material Target Material Tantalum Nitride Sputtering Target High Purity Tantalum Nitride Target Changsha Xinkang Advanced Materials Co., Ltd.	1076 byte

402.99.99% Pure Sio2 Sputtering Target Silicon Dioxide Disc for Thin Film Coating Target Material Sio2 Target for Coating Sio2 Target Sputtering Changsha Xinkang Advanced Materials Co., Ltd.	1216 byte

403.Agal Alloy Target Silver Aluminum Sputtering Target for Reflective Coatings Target Material Silver Aluminum Sputtering Target Silver Aluminum Target Lonwin Industry Group Limited	6404 byte

404.OEM Durable Premium High Quality Metal Sputtering Yttrium Target Target Material Premium Sputtering Target Durable Yttrium Sputtering Inner Mongolia Rongtai Rhenium New Materials Co., Ltd.	2232 byte

405.99.5% Pure Boron Carbide B4c Ceramic Sputtering Target Target Material Boron Carbide Sputtering Target B4c Target Changsha Xinkang Advanced Materials Co., Ltd.	1331 byte

406.99.99% Limno3 Sputtering Target Pure Limno3 Target for Magnetron Sputtering Target Material Limno3 Target Limno3 Disk Changsha Xinkang Advanced Materials Co., Ltd.	3875 byte

407.Xinkang Lead Sputtering Target 99.9% Pb Lead Metal Target Supplier Target Material Lead Target High Purity Lead Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	3825 byte

408.PVD Target 3n Lab6 Disc Lab6 Sputtering Target Target Material Lab6 Target Lab6 Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	1472 byte

409.PVD Target 3n5 Mo Target Molybdenum Sputtering Target Target Material Molybdenum Molybdenum Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	1397 byte

410.99.99% Pure Metal Nickel Sputtering Target Ni Target Sputtering with Round and Plate Target Material Nickel Material Nickel Bar Changsha Xinkang Advanced Materials Co., Ltd.	3877 byte

411.High Quality Molybdenum Sputtering Target Mo Bonding Target Material Sputtering Target Molybdenum Beenine Shanke Technology Co., Ltd.	1768 byte

412.Titanium Aluminum Alloy Targets/Titanium Sputtering Targets/Tial Alloy Target Target Material Titanium Aluminum Alloy Targets Tial Alloy Target Zhongzheng Yejin Technology Co., Ltd.	919 byte

413.99.9%Min PVD Target Iron Trioxide Fe2o3 Iron Oxide Sputtering Target with Copper Backing Plate Target Material Iron Oxide Target Iron Oxide Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	4862 byte

414.99.95% Cosi2 Sputtering Targets Cobalt Silicide Ceramic Sputtering Targets Target Material Cobalt Silicide Sputtering Target Cosi2 Sputtering Target Lonwin Industry Group Limited	5947 byte

415.High Purity Molybdenum Boride (MoB) Sputtering Target for Coating Applications Ceramic Material Molybdenum Boride Sputtering Target Mob Target Material Changsha Xinkang Advanced Materials Co., Ltd.	6476 byte

416.Premium Vacuum Pack Titanium Silicon Sputtering Targets for Advanced Thin Film Applications Target Material Vacuum Pack Targets Titanium Sputtering Targets Changsha Xinkang Advanced Materials Co., Ltd.	5496 byte

417.Ceramic Targets Boron Sputtering Target 99.9% B Disc for Coating Target Material Boron Target Price Ceramic Boron Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	5457 byte

418.Xinkang 99.99% Aluminum Sputtering Target Al Target Customized Size for Vacuum Coating Target Material Aluminum Sputtering Target Metal Al Aluminum Changsha Xinkang Advanced Materials Co., Ltd.	7474 byte

419.Znsn50/50wt% Alloy Sputtering Target with 99.9% Purity and Custom Sizes Target Material Znsn50 Alloy Target Znsn50 Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	4004 byte

420.Xinkang 4n 99.99% High Purity Aluminum Planar Sputtering Target for Vacuum/PVD Coating Target Material Aluminum Sputtering Target Aluminum Target Changsha Xinkang Advanced Materials Co., Ltd.	6505 byte

421.Xinkang 4n 99.99% High Purity Magnesium Planar Sputtering Target for Vacuum/PVD Coating Target Material Magnesium Target Magnesium Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	4237 byte

422.99.9% Pure Zral Alloy Target Zirconium Aluminum Sputtering Target Target Material Zirconium Aluminum Sputtering Target Zirconium Aluminum Target Lonwin Industry Group Limited	5522 byte

423.High Purity Copper Sputtering Target Pellets Target Material Sputtering Target for Copper Custom Copper Backing Plate Changsha Xinkang Advanced Materials Co., Ltd.	4346 byte

424.Top Ranking Metal Indium Sputtering Target in Indium Magnetron Target for LCD Evaporation Material High Purity Indium Sputtering Target for LCD Changsha Xinkang Advanced Materials Co., Ltd.	5603 byte

425.99.95% Iron Sputtering Target Metal Fe Magnetron Sputtering Targets Customzied Size Target Material Iron Disc Iron Target Changsha Xinkang Advanced Materials Co., Ltd.	3091 byte

426.Ruthenium Target High Purity Sputtering Round Target Target Material Ruthenium Target Target Material Dongguan Gravel Industries and Enterprise Company Limited	594 byte

427.Aluminum Zinc Sputtering Target for Superior Thin Film Applications Target Material Aluminum Zinc Target Sputtering Material Changsha Xinkang Advanced Materials Co., Ltd.	3379 byte

428.Tib2 Ceramics Sputtering Target Titanium Diboride New type Chemical Material Titanium Diboride Titanium Diboride Ceramic Shandong Pengcheng Advanced Ceramics Co., Ltd.	2193 byte

429.Titanium Nitride Target 99.5% with Ofhc Copper Backing Plate for Vacuum Coating Target Material High Purity Tin Ceramic Target 99.5% Titanium Nitride Target Changsha Xinkang Advanced Materials Co., Ltd.	4460 byte

430.Nickel Copper Titanium Alloy Sputtering Targets Nicuti 99.9% Disc for Coating Applications Evaporation Material Alloy Sputtering Disc Target Copper Alloy Sputtering Disc Changsha Xinkang Advanced Materials Co., Ltd.	3951 byte

431.Copper Indium Gallium Cuinga Alloy Sputtering Target for Vacuum Coating Target Material Copper Indium Target High Purity Copper Indium Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	3846 byte

432.99.99% Mgf2 Sputtering Target Mgf2 Magnetron Target for PVD Coating Target Material 99.99% Mgf2 Mgf2 Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	1782 byte

433.Ceramic Target 99.99% Nio Nickel Oxide Sputtering Target Target Material Nio Nickel Oxide Nio Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	2092 byte

434.99.9% Mno2 Sputtering Target Pure Mno2 Target for Sputtering Target Material Mno2 Target Mno2 Disk Changsha Xinkang Advanced Materials Co., Ltd.	3871 byte

435.Square or Rectangle Tungsten-Nickel Alloy Sputtering Target Target Material Tungsten Nickel Chromium Target Sputtering Target Rheniumet Ltd.	1148 byte

436.99.99% Purity 4n Molybdenum Mo Sputtering Target PVD Coating Target Material Sputtering Target Molybdenum Beenine Shanke Technology Co., Ltd.	1762 byte

437.Xinkang 99.95% Purity Vacuum Metalizing Zirconium Target Zr Zirconium Sputtering Target Target Material Zirconium Target Zirconium Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	5266 byte

438.99.99% Pure Pbo Ceramic Target Lead Oxide Sputtering Target Target Material Lead Oxide Sputtering Target Pure Pbo Target Lonwin Industry Group Limited	5049 byte

439.High Pure 99.99% 99.995% Nickel Magnetron Sputtering Target for Advanced Coatings Target Material Nickel Sputtering Target Nickel Target Changsha Xinkang Advanced Materials Co., Ltd.	236 byte

440.4n 99.99% Tungsten Trioxide Wo3 Ceramic Sputtering Target for PVD Coating Target Material Tungsten Trioxide Target Tungsten Oxide Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	4922 byte

441.Copper Indium Alloy Sputtering Target Cuin1wt% Targets for PVD Coating Target Material Copper Indium Target High Purity Copper Indium Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	3838 byte

442.99.98%~99.998% Aluminum Al Target for Electrolytic Capacitors Target Material Aluminum Sputtering Target Al Sputtering Target Rheniumet Ltd.	2591 byte

443.High Pure 99.99% Palladium Sputtering Target Target Material Palladium Target Sputtering Target Rheniumet Ltd.	2102 byte

444.High Purity Mo Molybdenum Sputtering Target Target Material Molybdenum Target Mo Sputtering Target Rheniumet Ltd.	1206 byte

445.Thin Film Coating MOS2 Sputtering Target Molybdenum Disulfide Ceramic Target Target Material MOS2 Ceramic Target Molybdenum Disulfide Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	5217 byte

446.99.99% Pure Tellurium Sputtering Target High Purity Metal Tellurium Target for Sputtering Target Material Tellurium Material Tellurium Bar Changsha Xinkang Advanced Materials Co., Ltd.	3856 byte

447.99.95% Pure Molybdenum Sputtering Target High Purity Molybdenum Target for Sputtering Target Material Molybdenum Material Molybdenum Disk Changsha Xinkang Advanced Materials Co., Ltd.	3876 byte

448.Sputtering Target Target Material Target Material Titanium target ATM Material Co., Ltd.	1697 byte

449.Customized High Purity Ruthenium Oxide Sputtering Target Target Material Customized Ruo2 Sputtering Target Thin Film Deposition Materials Changsha Xinkang Advanced Materials Co., Ltd.	1149 byte

450.Pzt Sputtering Target 99.99% Pure Pzt Target Target Material Sputter Target Compond Disk Changsha Xinkang Advanced Materials Co., Ltd.	3869 byte

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