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Four-Channel CVD Tube Furnace for Growth of Nanomaterial1
Laboratory InstrumentsFurnaceTube Furnace
HENAN RUNJING INSTRUMENT EQUIPMENT CO.,LTD
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Product Description Open High-Throughput Four-Channel Tube Furnace Technical SpecificationsProduct OverviewA specialized high-temperature system designed for simultaneous multi-sample processing in materials science, chemistry, electronics, ceramics, and nanotechnology applications. Its quad-channel configuration enables parallel experiments or production, significantly enhancing research efficiency and manufacturing flexibility.Key FeaturesMulti-Channel DesignFour independent heating channels (φ80×200mm each)Enables comparative studies or batch processingIncreases throughput by 300% vs single-tube systemsHigh-Temperature PerformanceMaximum temperature: 1200oCOperating range: 300-1150oCHeating rate: 1-20oC/min±1oC temperature uniformityAdvanced Control SystemQuad-zone independent temperature control7" touchscreen interfaceProgrammable heating profiles (multiple presets)Real-time data logging and exportRemote monitoring capabilityAtmosphere FlexibilitySupports air, inert gases (N2/Ar), reducing/oxidizing atmospheresVacuum capability (≤10Pa with mechanical pump)Integrated gas flow control systemTechnical SpecificationsParameterSpecificationModelRJ-O1200-50TI-80-4Power Supply3-phase 380V/50HzRated Power5KWHeating ElementsFe-Cr-Al alloyThermocoupleS-typeChamber Dimensionsφ80×200mm (per channel)Furnace Dimensions1180×1650×610mmWeight≈180kgControl Accuracy±1oCVacuum SystemMechanical pump (10Pa)Pressure MonitoringMechanical gauge (hermetic design)System ComponentsHeating SystemFour independently controlled zonesMo-doped Fe-Cr-Al alloy heating elementsSealing SystemHigh-vacuum flange designLeak-tested gas delivery systemSafety FeaturesOver-temperature protectionPressure monitoringEmergency protocols for high-temp operationOperational GuidelinesTemperature RestrictionsNo chamber opening above 300oCMonitor for normal thermal cracks during prolonged useAtmosphere ControlUse pressure regulators for gas inputFollow vacuum temperature limitsService Support1-year limited warranty (excludes consumables)Lifetime technical supportComparative AdvantagesThroughput: Processes 4 samples simultaneously with individual controlPrecision: Maintains ±1oC accuracy across all channelsFlexibility: Supports diverse atmospheres for complex material studiesThis system represents an optimal solution for research requiring high-throughput thermal processing with precise environmental control, particularly valuable for:Parallel material synthesis optimizationBatch quality testingComparative studies under identical thermal conditionsThe quad-channel design provides laboratory efficiency comparable to industrial-scale systems while maintaining precise research-grade control parameters.
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