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6kw-CVD/Microwave Plasma Chemical Vapor Deposition Equipment/Artificial Diamond Equipment1
Laboratory InstrumentsCVDMpcvd
Shanghai Anttrans Technology Co., Ltd
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Product Description Product Description equipment introductionThe Microwave Plasma Chemical Vapor Deposition (MPCVD) equipment is a high-configuration, multi-purpose, and highly stable medium-pressure microwave plasma (MPCVD) integrated processing device. It is suitable for applications in high-tech fields such as the chemical vapor deposition (CVD) of single-crystal and polycrystalline diamond films; material surface treatment and modification; and the growth of low-temperature oxides. The base platform available for diamond production is 3 inches in diameter, and its built-in 360° automatic rotation function enables more balanced diamond cultivation.Product Parameters Equipment parametersItem NameModelConfigurationFully Automatic Control System Automatic matching of gas pressure, temperature, and powerMicrowave Power Supply10KWMicrowave control power supply and microwave generatorMicrowave Transmission System and Cavity Waveguide, circular cavityMode Converter BJ26Working base8CM diameterWater-cooled, electric lifting, 360-degree electric continuous rotation5-Channel Gas Flow Control SystemSelect 5 channels500SCCM H2, 60sccm N2, 60sccm CH4, 60sccm O2, 60sccm ArVacuum and Gas Pipeline Gas mixer, bellows, etc.Direct-Connected Mechanical Pump 6 liters/secondMembrane meter Range 10Pa-99kPaVacuum Gauge 10^- 1 to 10^-9 PaSubstrate Infrared Temperature Measurement High-precision infrared thermometer with a temperature range of 150-1200°CScreen PLC14-inch LCD screenPLCDetailed Photos
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