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Innovative CVD Graphene Preparation High Temperature Furnace with Sliding Tube Design1
Laboratory InstrumentsVacuum FurnaceFurnace
HENAN RUNJING INSTRUMENT EQUIPMENT CO.,LTD
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Product Description Rail-Moving Rapid Annealing Furnace Product OverviewProduct IntroductionThe Rail-Moving Rapid Annealing Furnace is a cutting-edge thermal processing system designed for ultra-fast heating and cooling cycles, achieving heating rates up to 100°C/sec. Its sliding chamber design enables rapid sample cooling by automatically moving the furnace away post-annealing, making it ideal for semiconductor, photovoltaic, and advanced material research. Key FeaturesUltra-Fast Heating & CoolingShort-wave infrared heating (1.1-1.5 μm) delivers 100°C/sec heating rates without direct contact.Automated rail movement instantly shifts the furnace away post-processing, enabling rapid cooling.High-Purity Insulation & UniformityAl2O3 fiber insulation ensures energy efficiency and thermal stability.Annular heating design guarantees uniform temperature distribution (±1°C).Intelligent Control & AutomationTouchscreen interface with programmable annealing curves (multiple presets).Three heating modes: Full-zone, left-end, or right-end heating.Remote monitoring and data export capabilities.Multi-Atmosphere CompatibilitySupports vacuum (≤10 Pa with mechanical pump, ≤3.5×10-3Pa with molecular pump) and inert gases (N2, Ar).Integrated gas flow system with float flow meters for precise atmosphere control.Safety & ReliabilityOver-temperature protection and emergency stop button.Mechanical pressure gauge with shock-absorbing oil for durability. Technical SpecificationsParameterValueModelRJ-CHR1200-60TI / 80TI / 100TIMax Temperature1150°C (≤1 hour) / 1100°C (continuous)Heating Rate≤100°C/secTemperature Accuracy±1°CPower Supply3-phase 380V, 15 kWFurnace TubeΦ60/80/100×1000mm (customizable)Heating Zone Length200mm (150mm uniform zone)Cooling MethodAutomated rail movementDimensionsVaries by model (see images)Optional AccessoriesHigh-vacuum pump systems (mechanical/molecular).Corrosion-resistant gas preheaters. ApplicationsSemiconductor annealing (e.g., wafer processing).Thin-film deposition (PV, OLED).Metal/alloy rapid quenching. Safety GuidelinesDo not open the furnace above 300°C.Pressure limit: ≤0.125 MPa (absolute).Vacuum mode: Max 800°C; above 1000°C, maintain ambient pressure.Use pressure regulators (0.01-0.15 MPa range) for gas cylinders. Service & Support1-year warranty (excludes consumables like quartz tubes).Lifetime technical assistance.
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